PC

Pao-Hwa Chou

TL Tokyo Electron Limited: 27 patents #155 of 5,567Top 3%
IBM: 2 patents #32,839 of 70,183Top 50%
Overall (All Time): #146,989 of 4,157,543Top 4%
27
Patents All Time

Issued Patents All Time

Showing 1–25 of 27 patents

Patent #TitleCo-InventorsDate
9466476 Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide film Jun Sato 2016-10-11
9460913 Film-forming method for forming silicon oxide film on tungsten film or tungsten oxide film Jun Sato 2016-10-04
8734901 Film deposition method and apparatus Keisuke Suzuki, Te ching Chang 2014-05-27
8673725 Multilayer sidewall spacer for seam protection of a patterned structure David L. O'Meara, Anthony Dip, Aelan Mosden, Richard A. Conti 2014-03-18
8664102 Dual sidewall spacer for seam protection of a patterned structure David L. O'Meara, Anthony Dip, Aelan Mosden, Richard A. Conti 2014-03-04
8658247 Film deposition method Toshiyuki Ikeuchi, Kazuya Yamamoto, Kentaro Sera 2014-02-25
8642486 Thin film forming method, thin film forming apparatus, and program Toshiyuki Ikeuchi, Kazuya Yamamoto, Kentarou SERA 2014-02-04
8591989 SiCN film formation method and apparatus Kazuhide Hasebe 2013-11-26
8563096 Vertical film formation apparatus and method for using same Masanobu Matsunaga, Masato Yonezawa, Masayuki Hasegawa, Kazuhide Hasebe 2013-10-22
8383522 Micro pattern forming method Shigeru Nakajima, Kazuhide Hasebe, Mitsuaki Iwashita, Reiji Niino 2013-02-26
8343594 Film formation method and apparatus for semiconductor process Kazuhide Hasebe, Mitsuhiro Okada, Chaeho Kim, Byounghoon Lee 2013-01-01
8216648 Film formation method and apparatus Masanobu Matsunaga, Keisuke Suzuki, Jaehyuk Jang, Masato Yonezawa, Masayuki Hasegawa +1 more 2012-07-10
8178448 Film formation method and apparatus for semiconductor process Nobutake Nodera, Masanobu Matsunaga, Kazuhide Hasebe, Koto Umezawa 2012-05-15
8168375 Patterning method Shigeru Nakajima, Kazuhide Hasebe, Mitsuaki Iwashita, Reiji Niino 2012-05-01
8080290 Film formation method and apparatus for semiconductor process Kazuhide Hasebe, Nobutake Nodera, Masanobu Matsunaga, Jun Satoh 2011-12-20
8034673 Film formation method and apparatus for forming silicon-containing insulating film doped with metal Kentaro Kadonaga, Yamato Tonegawa, Kazuhide Hasebe, Tetsuya Shibata 2011-10-11
8025931 Film formation apparatus for semiconductor process and method for using the same Kazuhide Hasebe 2011-09-27
7989354 Patterning method Shigeru Nakajima, Kazuhide Hasebe, Mitsuaki Iwashita, Reiji Niino 2011-08-02
7964241 Film formation method and apparatus for semiconductor process Kazuhide Hasebe, Kota Umezawa, Kentaro Kadonaga, Hao-Hsiang Chang 2011-06-21
7959733 Film formation apparatus and method for semiconductor process Kazuhide Hasebe, Chaeho Kim 2011-06-14
7758920 Method and apparatus for forming silicon-containing insulating film Kazuhide Hasebe, Mitsuhiro Okada, Jun Ogawa, Chaeho Kim, Kohei Fukushima +2 more 2010-07-20
7754622 Patterning method utilizing SiBN and photolithography Kazuhide Hasebe, Shigeru Nakajima, Yasushi Akasaka, Mitsuaki Iwashita, Reiji Niino 2010-07-13
7718497 Method for manufacturing semiconductor device Yasushi Akasaka, Noriaki Fukiage, Yoshihiro Kato, Kazuhide Hasebe 2010-05-18
7507676 Film formation method and apparatus for semiconductor process Kazuhide Hasebe 2009-03-24
7462571 Film formation method and apparatus for semiconductor process for forming a silicon nitride film Kazuhide Hasebe, Mitsuhiro Okada, Chaeho Kim, Jun Ogawa 2008-12-09