Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12237167 | Deposition method | Ken OKOSHI, Keiji TABUKI | 2025-02-25 |
| 12060640 | Film forming method and system | Jinseok Kim | 2024-08-13 |
| 11923177 | Plasma processing apparatus and plasma processing method | Keiji TABUKI, Kazumasa Igarashi, Kazuo Yabe | 2024-03-05 |
| 11781219 | Processing apparatus and processing method | Kazuo Yabe, Kazumasa Igarashi | 2023-10-10 |
| 11694890 | Substrate processing method and substrate processing apparatus | Kiwamu ITO, Keiko Hosoe | 2023-07-04 |
| 10573514 | Method of forming silicon-containing film | Tsubasa WATANABE | 2020-02-25 |
| 10535501 | Film forming apparatus, film forming method and non-transitory storage medium | Katsutoshi Ishii | 2020-01-14 |
| 10388511 | Method of forming silicon nitride film, film forming apparatus and storage medium | — | 2019-08-20 |
| 10217630 | Method of forming silicon-containing film | Tsubasa WATANABE | 2019-02-26 |
| 8153451 | System and method for performing semiconductor processing on target substrate | Koichi Sakamoto, Takehiko Fujita | 2012-04-10 |
| 8080109 | Film formation apparatus and method for using the same | Mitsuhiro Okada, Satoshi Takagi, Ryou Son, Masahiko Tomita, Toshiharu Nishimura | 2011-12-20 |
| 8034673 | Film formation method and apparatus for forming silicon-containing insulating film doped with metal | Kentaro Kadonaga, Pao-Hwa Chou, Kazuhide Hasebe, Tetsuya Shibata | 2011-10-11 |
| 7964516 | Film formation apparatus for semiconductor process and method for using same | Mitsuhiro Okada | 2011-06-21 |
| 7959737 | Film formation apparatus and method for using the same | Mitsuhiro Okada, Satoshi MIZUNAGA, Toshiharu Nishimura | 2011-06-14 |
| 7938080 | Method for using film formation apparatus | Naotaka Noro, Takehiko Fujita, Norifumi Kimura | 2011-05-10 |
| 7494943 | Method for using film formation apparatus | Naotaka Noro, Takehiko Fujita, Norifumi Kimura | 2009-02-24 |
| 7179334 | System and method for performing semiconductor processing on substrate being processed | Koichi Sakamoto, Takehiko Fujita | 2007-02-20 |