Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11270895 | Gas introduction structure, treatment apparatus, and treatment method | — | 2022-03-08 |
| 10876204 | Substrate processing apparatus, exhaust pipe coating method and substrate processing method | — | 2020-12-29 |
| 10799896 | Substrate processing apparatus, method of coating particle in process gas nozzle and substrate processing method | — | 2020-10-13 |
| 10559460 | Film forming apparatus and film forming method | Akira Shimizu, Akinobu Teramoto, Tomoyuki Suwa, Yoshinobu Shiba | 2020-02-11 |
| 10535501 | Film forming apparatus, film forming method and non-transitory storage medium | Yamato Tonegawa | 2020-01-14 |
| 8834817 | Method for removing metal impurity from quartz component part used in heat processing apparatus of batch type | Masahisa Watanabe, Tetsuya Shibata | 2014-09-16 |
| 8394200 | Vertical plasma processing apparatus for semiconductor process | Hiroyuki Matsuura, Toshiki Takahashi, Jun Sato, Katsuyoshi Aikawa | 2013-03-12 |
| D564462 | RF electrode for a process tube of semiconductor manufacturing apparatus | Hiroyuki Matsuura | 2008-03-18 |
| 7211295 | Silicon dioxide film forming method | Yutaka Takahashi, Hitoshi Kato, Kazutoshi Miura | 2007-05-01 |
| D521464 | Process tube for semiconductor device manufacturing apparatus | Hiroyuki Matsuura | 2006-05-23 |
| D521465 | Process tube for semiconductor device manufacturing apparatus | Hiroyuki Matsuura | 2006-05-23 |
| D520467 | Process tube for semiconductor device manufacturing apparatus | Hiroyuki Matsuura | 2006-05-09 |
| 6903030 | System and method for heat treating semiconductor | Yutaka Takahashi, Harunari Hasegawa | 2005-06-07 |
| 6884295 | Method of forming oxynitride film or the like and system for carrying out the same | Kazutoshi Miura | 2005-04-26 |
| 6863732 | Heat treatment system and method | Takanobu Asano, Hiroyuki Yamamoto, George Hoshi, Kazutoshi Miura | 2005-03-08 |
| 6540509 | Heat treatment system and method | Takanobu Asano, Hiroyuki Yamamoto, George Hoshi, Kazutoshi Miura | 2003-04-01 |
| 6516143 | Fluid heating apparatus | Eiichi Toya, Tomio Konn, Tomohiro Nagata, Sunao Seko, Takanori Saito +3 more | 2003-02-04 |
| 6110286 | Vertical processing unit | Seungho Oh, Toshiharu Nishimura, Yutaka Takahashi | 2000-08-29 |
| D429224 | Quartz fin heat retaining tube | — | 2000-08-08 |
| D428858 | Quartz fin heat retaining tube | — | 2000-08-01 |
| D427570 | Quartz fin heat retaining tube | — | 2000-07-04 |
| D426521 | Quartz fin heat retaining tube | — | 2000-06-13 |
| D425871 | Quartz fin heat retaining tube | — | 2000-05-30 |
| D424527 | Quartz fin heat retaining tube | — | 2000-05-09 |
| D410438 | Heat retaining tube for use in a semiconductor wafer heat processing apparatus | — | 1999-06-01 |