NF

Noriaki Fukiage

TL Tokyo Electron Limited: 25 patents #181 of 5,567Top 4%
IBM: 1 patents #44,794 of 70,183Top 65%
📍 Rifu, NY: #2 of 5 inventorsTop 40%
Overall (All Time): #160,656 of 4,157,543Top 4%
25
Patents All Time

Issued Patents All Time

Showing 1–25 of 25 patents

Patent #TitleCo-InventorsDate
12077855 Cleaning method and film deposition apparatus Hideomi HANE, Akihiro Kuribayashi 2024-09-03
11970768 Film forming method and film forming apparatus Hideomi HANE, Shimon Otsuki, Takeshi Oyama, Ren MUKOUYAMA, Jun Ogawa 2024-04-30
11725276 Plasma purge method Hideomi HANE, Hyunjoon Bang 2023-08-15
11508571 Film forming method and film forming apparatus Jun Ogawa 2022-11-22
11201053 Film forming method and film forming apparatus Takayuki Karakawa, Toyohiro KAMADA, Akihiro Kuribayashi, Takeshi Oyama, Jun Ogawa +3 more 2021-12-14
11171014 Substrate processing method and substrate processing apparatus Hideomi HANE, Kentaro Oshimo, Shimon Otsuki, Jun Ogawa, Hiroaki Ikegawa +2 more 2021-11-09
10900121 Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor device Kentaro Oshimo, Shimon Otsuki, Hideomi HANE, Jun Ogawa, Hiroaki Ikegawa 2021-01-26
10714332 Film forming method and film forming apparatus Takayuki Karakawa, Toyohiro KAMADA, Akihiro Kuribayashi, Takeshi Oyama, Jun Ogawa +3 more 2020-07-14
10626496 Film forming apparatus, method of cleaning film forming apparatus, and storage medium Takayuki Karakawa, Jun Ogawa, Yasuo Kobayashi 2020-04-21
10573512 Film forming method Takeshi Oyama 2020-02-25
10438791 Film forming method, film forming apparatus, and storage medium Hideomi HANE, Kentaro Oshimo, Shimon Otsuki, Jun Ogawa, Hiroaki Ikegawa +2 more 2019-10-08
10151029 Silicon nitride film forming method and silicon nitride film forming apparatus Takeshi Oyama, Jun Ogawa 2018-12-11
9922820 Film forming method and film forming apparatus Takayuki Karakawa, Toyohiro KAMADA, Akihiro Kuribayashi, Takeshi Oyama, Jun Ogawa 2018-03-20
9892909 Film forming method and film forming apparatus Takayuki Karakawa, Akihiro Kuribayashi, Jun Ogawa 2018-02-13
9478410 Method of forming nitride film with plasma Toyohiro KAMADA, Takayuki Karakawa 2016-10-25
8419859 Method of cleaning plasma-treating apparatus, plasma-treating apparatus where the cleaning method is practiced, and memory medium memorizing program executing the cleaning method Shinji Komoto, Hiroyuki Takaba, Kiyotaka Ishibashi 2013-04-16
7862683 Chamber dry cleaning 2011-01-04
7718497 Method for manufacturing semiconductor device Yasushi Akasaka, Yoshihiro Kato, Kazuhide Hasebe, Pao-Hwa Chou 2010-05-18
7611758 Method of improving post-develop photoresist profile on a deposited dielectric film Katherina Babich 2009-11-03
7371436 Method and apparatus for depositing materials with tunable optical properties and etching characteristics 2008-05-13
7201174 Processing apparatus and cleaning method 2007-04-10
6773762 Plasma treatment method 2004-08-10
6753610 Semiconductor device having multilayer interconnection structure and method of making the same 2004-06-22
6699531 Plasma treatment method 2004-03-02
6576569 Method of plasma-assisted film deposition 2003-06-10