Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12191140 | Method for manufacturing semiconductor device and substrate processing apparatus | Atsushi Endo | 2025-01-07 |
| 12131947 | Method for manufacturing semiconductor device and substrate processing apparatus | Satoshi Takagi, Akari Matsunaga, Keisuke Fujita | 2024-10-29 |
| 12027384 | Heat treatment apparatus and dummy substrate processing method | Yoshihiro TAKEZAWA | 2024-07-02 |
| 11851752 | Method for forming silicon film and processing apparatus | Akari Matsunaga, Satoshi Takagi | 2023-12-26 |
| 11807938 | Exhaust device, processing system, and processing method | Rui KANEMURA | 2023-11-07 |
| 11587787 | Film forming method and film forming apparatus | Yoshihiro TAKEZAWA, Daisuke Suzuki, Hiroyuki Hayashi | 2023-02-21 |
| 11239076 | Film forming method and heat treatment apparatus | Hiroyuki Hayashi | 2022-02-01 |
| 11062904 | Method of forming polysilicon film and film forming apparatus | Atsushi Endo | 2021-07-13 |
| 10957535 | Semiconductor film forming method and film forming apparatus | Younggi HONG | 2021-03-23 |
| 10676820 | Cleaning method and film forming method | Mitsuhiro Okada | 2020-06-09 |
| 9970111 | Substrate processing apparatus having ground electrode | Kohei Fukushima, Hiroyuki Matsuura, Koichi Shimada, Takeshi Ando | 2018-05-15 |
| 9776202 | Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus | Keisuke Suzuki, Kohei Fukushima, Shingo Hishiya | 2017-10-03 |
| D786810 | Dummy wafer | Kohei Fukushima | 2017-05-16 |
| D785576 | Dummy wafer | Kohei Fukushima | 2017-05-02 |
| D784937 | Dummy wafer | Kohei Fukushima | 2017-04-25 |
| 9487859 | Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatus | Kohei Fukushima, Keisuke Suzuki, Hiromi Takahashi | 2016-11-08 |
| 9373498 | Method of operating vertical heat treatment apparatus, vertical heat treatment apparatus and non-transitory recording medium | Keisuke Suzuki | 2016-06-21 |
| 8608902 | Plasma processing apparatus | Kohei Fukushima, Toshiki Takahashi, Hiroyuki Matsuura, Kazuya Yamamoto | 2013-12-17 |