Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12351904 | Film deposition method and method for forming polycrystalline silicon film | Tatsuya MIYAHARA, Daisuke Suzuki | 2025-07-08 |
| 12252786 | Cleaning method and substrate processing apparatus | Daisuke Suzuki, Hiroyuki Hayashi, Tatsuya MIYAHARA, Keisuke Fujita, Masami Oikawa +1 more | 2025-03-18 |
| 12112947 | Method of crystallizing amorphous silicon film and deposition apparatus | Tatsuya MIYAHARA, Daisuke Suzuki, Yuki TANABE | 2024-10-08 |
| 12080552 | Method of depositing silicon film and film deposition apparatus | Tatsuya MIYAHARA, Daisuke Suzuki, Hiroyuki Hayashi | 2024-09-03 |
| 12027384 | Heat treatment apparatus and dummy substrate processing method | Yutaka Motoyama | 2024-07-02 |
| 11749530 | Method of removing phosphorus-doped silicon film and system therefor | Masahisa Watanabe | 2023-09-05 |
| 11587787 | Film forming method and film forming apparatus | Daisuke Suzuki, Hiroyuki Hayashi, Yutaka Motoyama | 2023-02-21 |
| 11486043 | Metal contamination prevention method and apparatus, and substrate processing method using the same and apparatus therefor | Shigeru Nakajima, Katsushige Harada, Yusuke TACHINO | 2022-11-01 |
| 11260433 | Cleaning method of substrate processing apparatus and substrate processing apparatus | Daisuke Suzuki, Hiroyuki Hayashi, Sena FUJITA, Tatsuya MIYAHARA, Jyunji ARIGA +1 more | 2022-03-01 |
| 11047044 | Film forming apparatus and film forming method | Kuniyasu Sakashita, Shigeru Nakajima | 2021-06-29 |
| 10734221 | Method of manufacturing semiconductor device and method of forming metal oxide film | Taiki KATO, Hisashi Higuchi, Kosuke Yamamoto, Ayuta Suzuki, Kazuyoshi Matsuzaki +2 more | 2020-08-04 |
| 9234275 | Method and apparatus of forming metal compound film, and electronic product | Katsushige Harada | 2016-01-12 |