Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8608901 | Process chamber cleaning method in substrate processing apparatus, substrate processing apparatus, and substrate processing method | Masaru Sasaki, Tetsuro Takahashi, Koji Maekawa | 2013-12-17 |
| 8394231 | Plasma process device and plasma process method | Koichi Takatsuki, Hikaru Yoshitaka, Shigeo Ashigaki, Yoichi Inoue, Takashi Akahori +7 more | 2013-03-12 |
| 7915177 | Method of forming gate insulation film, semiconductor device, and computer recording medium | Tatsuo Nishita, Yutaka Fujino, Toshio Nakanishi, Yoshihiro Sato | 2011-03-29 |
| 7842621 | Method of measuring nitrogen concentration, method of forming silicon oxynitride film, and method of manufacturing semiconductor device. | Jiro Katsuki, Tetsuro Takahashi | 2010-11-30 |
| 7695763 | Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate | Masaru Sasaki, Tetsuro Takahashi, Koji Maekawa | 2010-04-13 |
| 7674722 | Method of forming gate insulating film, semiconductor device and computer recording medium | Tatsuo Nishita, Yutaka Fujino, Toshio Nakanishi, Yoshihiro Sato | 2010-03-09 |