Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11915951 | Plasma processing method | Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Tatehito Usui, Yutaka Kouzuma +4 more | 2024-02-27 |
| 11398371 | Plasma processing apparatus | Kenetsu Yokogawa, Taku Iwase | 2022-07-26 |
| 11287782 | Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method | Takeshi Ohmori, Hyakka Nakada, Masaru Kurihara, Tatehito Usui | 2022-03-29 |
| 11189470 | Search device, search method and plasma processing apparatus | Takeshi Ohmori, Hyakka Nakada, Masayoshi Ishikawa, Masaru Kurihara | 2021-11-30 |
| 11152237 | Substitute sample, method for determining control parameter of processing, and measurement system | Hyakka Nakada, Takeshi Ohmori, Tatehito Usui, Masaru Kurihara | 2021-10-19 |
| 10418254 | Etching method and etching apparatus | Kazunori Shinoda, Hiroyuki Kobayashi, Nobuya Miyoshi, Kohei Kawamura, Masaru Izawa +2 more | 2019-09-17 |
| 10418224 | Plasma etching method | Ken'etsu Yokogawa, Nobuyuki Negishi, Masami Kamibayashi, Masatoshi Miyake | 2019-09-17 |
| 10310321 | Optical element, manufacturing method of optical element, and optical device | Koji Hirata, Hiroyuki Minemura, Yumiko Anzai, Tetsuya Nishida, Jiro Yamamoto +2 more | 2019-06-04 |
| 9997337 | Plasma processing method and plasma processing apparatus | Masahito Mori, Naoshi Itabashi | 2018-06-12 |
| 9960014 | Plasma etching method | Ken'etsu Yokogawa, Nobuyuki Negishi, Masami Kamibayashi, Masatoshi Miyake | 2018-05-01 |
| 9933553 | Optical element and optical device | Koji Hirata, Hiroyuki Minemura, Yumiko Anzai, Tetsuya Nishida, Jiro Yamamoto +2 more | 2018-04-03 |
| 9099349 | Semiconductor device manufacturing method | Nobuyuki Negishi, Hiroaki Ishimura | 2015-08-04 |
| 9076637 | Plasma processing method and plasma processing apparatus | Masahito Mori, Naoshi Itabashi | 2015-07-07 |
| 8791027 | Method of manufacturing semiconductor device | Hideo Miura | 2014-07-29 |
| 8546266 | Plasma processing method and plasma processing apparatus | Masahito Mori, Naoshi Itabashi | 2013-10-01 |
| 8129283 | Plasma processing method and plasma processing apparatus | Masahito Mori, Naoshi Itabashi | 2012-03-06 |
| 8093529 | Control method of a temperature of a sample | Tsunehiko Tsubone | 2012-01-10 |
| 7680563 | Pressure control device for low pressure processing chamber | Hiroshi Akiyama, Masahiro Nagatani | 2010-03-16 |
| 7604709 | Plasma processing apparatus | Masaru Kurihara, Naoshi Itabashi, Takashi Tsutsumi | 2009-10-20 |
| 7479459 | Semiconductor device manufacturing method and semiconductor device manufacturing apparatus | — | 2009-01-20 |
| 7396771 | Plasma etching apparatus and plasma etching method | Go Miya, Seiichiro Kanno, Naoshi Itabashi, Motohiko Yoshigai, Junichi Tanaka +2 more | 2008-07-08 |
| 7371692 | Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film | — | 2008-05-13 |
| 7049243 | Surface processing method of a specimen and surface processing apparatus of the specimen | Tetsuo Ono, Yasuhiro Nishimori, Takashi Sato, Masaru Izawa, Yasushi Goto +7 more | 2006-05-23 |
| 6797112 | Plasma treatment apparatus and method of producing semiconductor device using the apparatus | Naoshi Itabashi, Yasunori Goto | 2004-09-28 |
| 6784109 | Method for fabricating semiconductor devices including wiring forming with a porous low-k film and copper | Masaru Izawa | 2004-08-31 |