Issued Patents All Time
Showing 25 most recent of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12381071 | Plasma processing method and plasma processing apparatus | Mitsuru Nagasawa, Soichiro Eto, Shigeru Nakamoto | 2025-08-05 |
| 12131964 | Plasma processing apparatus and plasma processing method | Kousuke Fukuchi, Ryoji Asakura, Soichiro Eto, Tsubasa Okamoto, Shigeru Nakamoto | 2024-10-29 |
| 12051574 | Wafer processing method and plasma processing apparatus | Hiroyuki Kobayashi, Atsushi Sekiguchi, Soichiro Eto, Shigeru Nakamoto, Kazunori Shinoda +1 more | 2024-07-30 |
| 11915951 | Plasma processing method | Hiroyuki Kobayashi, Nobuya Miyoshi, Kazunori Shinoda, Naoyuki Kofuji, Yutaka Kouzuma +4 more | 2024-02-27 |
| 11875978 | Plasma processing apparatus and plasma processing method | Tsubasa Okamoto, Miyako Matsui, Shigeru Nakamoto, Naohiro Kawamoto, Atsushi Sekiguchi | 2024-01-16 |
| 11569135 | Plasma processing method and wavelength selection method used in plasma processing | Yohei Kawaguchi, Shigeru Nakamoto | 2023-01-31 |
| 11462416 | Plasma processing method and plasma processing apparatus | Miyako Matsui, Kenichi Kuwahara, Hiroyuki Kobayashi | 2022-10-04 |
| 11437289 | Plasma processing apparatus and plasma processing method | Kousuke Fukuchi, Ryoji Asakura, Soichiro Eto, Tsubasa Okamoto, Shigeru Nakamoto | 2022-09-06 |
| 11424110 | Plasma processing apparatus and operational method thereof | Masahito Togami, Kosa Hirota, Satomi Inoue, Shigeru Nakamoto | 2022-08-23 |
| 11287782 | Computer, method for determining processing control parameter, substitute sample, measurement system, and measurement method | Takeshi Ohmori, Hyakka Nakada, Masaru Kurihara, Naoyuki Kofuji | 2022-03-29 |
| 11239097 | Etching apparatus and etching method and detecting apparatus of film thickness | Soichiro Eto, Hiroyuki Minemura | 2022-02-01 |
| 11152237 | Substitute sample, method for determining control parameter of processing, and measurement system | Hyakka Nakada, Takeshi Ohmori, Masaru Kurihara, Naoyuki Kofuji | 2021-10-19 |
| 11112775 | System and method of determining processing condition | Hyakka Nakada, Takeshi Ohmori, Masaru Kurihara | 2021-09-07 |
| 10971369 | Plasma processing method and plasma processing apparatus | Miyako Matsui, Masaru Izawa, Kenichi Kuwahara | 2021-04-06 |
| 10672595 | Plasma processing apparatus and operation method thereof | Takeshi Ohmori, Daisuke Satou, Satomi Inoue, Kenji Maeda | 2020-06-02 |
| 10665516 | Etching method and plasma processing apparatus | Miyako Matsui, Kenichi Kuwahara, Naoki Yasui, Masaru Izawa, Takeshi Ohmori | 2020-05-26 |
| 10453695 | Plasma processing apparatus and plasma processing method | Soichiro Eto, Takeshi Ohmori, Satomi Inoue | 2019-10-22 |
| 10020233 | Plasma processing apparatus and plasma processing method | Shigeru Nakamoto, Satomi Inoue, Kousa Hirota, Kousuke Fukuchi | 2018-07-10 |
| 10008370 | Plasma processing apparatus and operation method thereof | Takeshi Ohmori, Daisuke Satou, Satomi Inoue, Kenji Maeda | 2018-06-26 |
| 9934946 | Plasma processing apparatus and operating method of plasma processing apparatus | Yohei Kawaguchi, Masahito Togami, Satomi Inoue, Shigeru Nakamoto | 2018-04-03 |
| 9865439 | Plasma processing apparatus | Shigeru Nakamoto, Satomi Inoue, Kousuke Fukuchi | 2018-01-09 |
| 9805940 | Plasma processing apparatus and plasma processing method | Kousuke Fukuchi, Shigeru Nakamoto, Satomi Inoue | 2017-10-31 |
| 9767997 | Plasma processing apparatus and operational method thereof | Masahito Togami, Kosa Hirota, Satomi Inoue, Shigeru Nakamoto | 2017-09-19 |
| 9741629 | Plasma processing apparatus and plasma processing method | Kosa Hirota, Satomi Inoue, Shigeru Nakamoto, Kousuke Fukuchi | 2017-08-22 |
| 9190336 | Plasma processing apparatus and plasma processing method | Kousuke Fukuchi, Shigeru Nakamoto, Satomi Inoue, Kousa Hirota | 2015-11-17 |