TU

Tatehito Usui

HH Hitachi High-Technologies: 35 patents #72 of 1,917Top 4%
HI Hitachi: 31 patents #867 of 28,497Top 4%
HI Hitach: 1 patents #1 of 68Top 2%
OJ Opnext Japan: 1 patents #100 of 185Top 55%
TT Trecenti Technologies: 1 patents #5 of 22Top 25%
Overall (All Time): #34,511 of 4,157,543Top 1%
64
Patents All Time

Issued Patents All Time

Showing 51–64 of 64 patents

Patent #TitleCo-InventorsDate
6755932 Plasma processing system and apparatus and a sample processing method Toshio Masuda, Mitsuru Suehiro, Hiroshi Kanekiyo, Hideyuki Yamamoto, Kazue Takahashi +1 more 2004-06-29
6750977 Apparatus for monitoring thickness of deposited layer in reactor and dry processing method Toru Otsubo 2004-06-15
6716300 Emission spectroscopic processing apparatus Tetsunori Kaji, Shizuaki Kimura, Takashi Fujii 2004-04-06
6656752 Ion current density measuring method and instrument, and semiconductor device manufacturing method Nobuyuki Mise, Masato Ikegawa, Kazuo Nojiri, Kazuyuki Tsunokuni, Tetsuo Ono 2003-12-02
6596551 Etching end point judging method, etching end point judging device, and insulating film etching method using these methods Ken Yoshioka, Shoji Ikuhara, Kouji Nishihata, Kazue Takahashi, Tetsunori Kaji +1 more 2003-07-22
6537832 Measuring apparatus and film formation method Toru Otsubo 2003-03-25
6503364 Plasma processing apparatus Toshio Masuda, Shigeru Shirayone, Kazue Takahashi, Mitsuru Suehiro 2003-01-07
6427621 Plasma processing device and plasma processing method Masato Ikegawa, Tsutomu Tetsuka, Ichiro Sasaki, Hironobu Kawahara 2002-08-06
6373681 Electrostatic chuck, and method of and apparatus for processing sample using the chuck Seiichiro Kanno, Ken Yoshioka, Saburo Kanai, Youichi Itou 2002-04-16
6243251 Electrostatic chuck, and method of and apparatus for processing sample using the chuck Seiichiro Kanno, Ken Yoshioka, Saburo Kanai, Youichi Itou 2001-06-05
5946184 Electrostatic chuck, and method of and apparatus for processing sample Seiichiro Kanno, Ken Yoshioka, Saburo Kanai, Youichi Itou 1999-08-31
5895586 Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum Tetsunori Kaji, Saburo Kanai, Satoshi Ito, Ryoji Hamasaki, Tetsuo Ono +2 more 1999-04-20
5242539 Plasma treatment method and apparatus Takao Kumihashi, Kazunori Tsujimoto, Shinichi Tachi, Masafumi Kanetomo, Junichi Kobayashi +1 more 1993-09-07
5235399 Temperature measuring apparatus utilizing radiation Tomoji Watanabe, Junichi Kobayashi, Takehiko Ooshima, Shunji Sasabe 1993-08-10