Issued Patents All Time
Showing 1–25 of 35 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7455790 | Emission spectroscopic processing apparatus and plasma processing method using it | Shizuaki Kimura, Tatehito Usui, Takashi Fujii | 2008-11-25 |
| 7411684 | Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai | 2008-08-12 |
| 7230720 | Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai | 2007-06-12 |
| 7126697 | Method and apparatus for determining endpoint of semiconductor element fabricating process | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai, Hideyuki Yamamoto | 2006-10-24 |
| 7048869 | Plasma processing apparatus and a plasma processing method | Kazue Takahashi, Toshio Masuda, Ken'etsu Yokogawa | 2006-05-23 |
| 7009715 | Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai, Hideyuki Yamamoto | 2006-03-07 |
| 6979168 | Method and apparatus for transferring substrate | Yoichi Uchimaki, Yuko Egawa | 2005-12-27 |
| 6961131 | Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai | 2005-11-01 |
| 6903826 | Method and apparatus for determining endpoint of semiconductor element fabricating process | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai, Hideyuki Yamamoto | 2005-06-07 |
| 6902683 | Plasma processing apparatus and plasma processing method | Shinichi Tachi, Toru Otsubo, Katsuya Watanabe, Katsuhiko Mitani, Junichi Tanaka | 2005-06-07 |
| 6890771 | Plasma processing method using spectroscopic processing unit | Shizuaki Kimura, Tatehito Usui, Takashi Fujii | 2005-05-10 |
| 6815228 | Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method | Tatehito Usui, Takashi Fujii, Motohiko Yoshigai | 2004-11-09 |
| 6815365 | Plasma etching apparatus and plasma etching method | Toshio Masuda, Kazue Takahashi, Mitsuru Suehiro, Saburo Kanai | 2004-11-09 |
| 6758647 | System for producing wafers | Yoichi Uchimaki, Yuko Egawa | 2004-07-06 |
| 6716300 | Emission spectroscopic processing apparatus | Shizuaki Kimura, Tatehito Usui, Takashi Fujii | 2004-04-06 |
| 6596551 | Etching end point judging method, etching end point judging device, and insulating film etching method using these methods | Tatehito Usui, Ken Yoshioka, Shoji Ikuhara, Kouji Nishihata, Kazue Takahashi +1 more | 2003-07-22 |
| 6422172 | Plasma processing apparatus and plasma processing method | Jyunichi Tanaka, Toru Otsubo, Toshio Masuda, Ichiro Sasaki, Katsuya Watanabe | 2002-07-23 |
| 6245190 | Plasma processing system and plasma processing method | Toshio Masuda, Katsuhiko Mitani, Jun'ichi Tanaka, Katsuya Watanabe, Shigeru Shirayone +4 more | 2001-06-12 |
| 6197151 | Plasma processing apparatus and plasma processing method | Shinichi Tachi, Toru Otsubo, Katsuya Watanabe, Katsuhiko Mitani, Junichi Tanaka | 2001-03-06 |
| 6171438 | Plasma processing apparatus and plasma processing method | Toshio Masuda, Kazue Takahashi, Mitsuru Suehiro, Saburo Kanai | 2001-01-09 |
| 6172321 | Method and apparatus for plasma processing apparatus | Ken Yoshioka, Saburou Kanai, Ryoji Nishio, Manabu Edamura | 2001-01-09 |
| 6129806 | Plasma processing apparatus and plasma processing method | Shinichi Tachi, Toru Otsubo, Katsuya Watanabe, Katsuhiko Mitani, Junichi Tanaka | 2000-10-10 |
| 6046425 | Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber | Takashi Fujii, Motohiko Yoshigai, Yoshinao Kawasaki, Masaharu Nishiumi | 2000-04-04 |
| 6034346 | Method and apparatus for plasma processing apparatus | Ken Yoshioka, Saburou Kanai, Ryoji Nishio, Manabu Edamura | 2000-03-07 |
| 5895586 | Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum | Saburo Kanai, Satoshi Ito, Ryoji Hamasaki, Tetsuo Ono, Tatehito Usui +2 more | 1999-04-20 |