Issued Patents All Time
Showing 1–25 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10998168 | Plasma processing apparatus | Yusaku Sakka, Tadayoshi Kawaguchi | 2021-05-04 |
| 10541115 | Plasma processing apparatus | Yusaku Sakka, Tadayoshi Kawaguchi | 2020-01-21 |
| 10262835 | Plasma processing equipment and plasma generation equipment | — | 2019-04-16 |
| 10229813 | Plasma processing apparatus with lattice-like faraday shields | Tadayoshi Kawaguchi, Tsutomu Tetsuka | 2019-03-12 |
| 9805915 | Plasma processing apparatus | Masaharu Gushiken, Megumu Saitou | 2017-10-31 |
| 9566821 | Plasma processing apparatus and plasma processing method | Takamasa Ichino, Shinji Obama | 2017-02-14 |
| 9039865 | Plasma processing apparatus | Ken Yoshioka, Motohiko Yoshigai, Tadayoshi Kawaguchi | 2015-05-26 |
| 8940128 | Plasma processing apparatus | Yusaku Sakka, Ken Yoshioka | 2015-01-27 |
| 8906196 | Plasma processing apparatus and method for controlling the same | — | 2014-12-09 |
| 8795467 | Plasma processing apparatus and method | Ken Yoshioka, Saburou Kanai, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2014-08-05 |
| 8632637 | Method and apparatus for plasma processing | Tadamitsu Kanekiyo, Yoshiyuki Oota, Tsuyoshi Matsumoto | 2014-01-21 |
| 8425786 | Plasma etching method and plasma etching apparatus | Makoto Satake, Kenji Maeda, Kenetsu Yokogawa, Tsutomu Tetsuka, Tatehito Usui | 2013-04-23 |
| 8366870 | Method and apparatus for plasma processing | Tadamitsu Kanekiyo, Yoshiyuki Oota, Tsuyoshi Matsumoto | 2013-02-05 |
| 8329054 | Plasma processing apparatus and plasma processing method | Takamasa Ichino, Shinji Obama | 2012-12-11 |
| 8186300 | Plasma processing apparatus | Takamasa Ichino, Tomoyuki Tamura, Shinji Obama | 2012-05-29 |
| 8083889 | Apparatus and method for plasma etching | Go Miya, Manabu Edamura, Ken Yoshioka | 2011-12-27 |
| 8062473 | Plasma processing apparatus and method | Ken Yoshioka, Saburou Kanai, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2011-11-22 |
| 8057634 | Method and apparatus for plasma processing | Tadamitsu Kanekiyo, Yoshiyuki Oota, Tsuyoshi Matsumoto | 2011-11-15 |
| 7892444 | Plasma processing apparatus and method for controlling the same | — | 2011-02-22 |
| 7833429 | Plasma processing method | Ken Yoshioka, Saburou Kanai, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2010-11-16 |
| 7740739 | Plasma processing apparatus and method | Ken Yoshioka, Saburou Kanai, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2010-06-22 |
| 7713756 | Apparatus and method for plasma etching | Go Miya, Manabu Edamura, Ken Yoshioka | 2010-05-11 |
| 7183715 | Method for operating a semiconductor processing apparatus | Seiichiro Kanno, Ken Yoshioka, Saburou Kanai, Hideki Kihara, Hideyuki Yamamoto | 2007-02-27 |
| 7138606 | Wafer processing method | Seiichiro Kanno, Ken Yoshioka, Saburou Kanai, Hideki Kihara, Koji Okuda | 2006-11-21 |
| 6967109 | Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units | Tatehito Usui, Tetsuo Ono, Kazue Takahashi, Nobuyuki Mise | 2005-11-22 |