Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8795467 | Plasma processing apparatus and method | Ryoji Nishio, Ken Yoshioka, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2014-08-05 |
| 8062473 | Plasma processing apparatus and method | Ryoji Nishio, Ken Yoshioka, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2011-11-22 |
| 7833429 | Plasma processing method | Ryoji Nishio, Ken Yoshioka, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2010-11-16 |
| 7740739 | Plasma processing apparatus and method | Ryoji Nishio, Ken Yoshioka, Tadamitsu Kanekiyo, Hideki Kihara, Koji Okuda | 2010-06-22 |
| 7608162 | Plasma processing apparatus and method | Yutaka Ohmoto, Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi | 2009-10-27 |
| 7288166 | Plasma processing apparatus | Yutaka Ohmoto, Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi | 2007-10-30 |
| 7183715 | Method for operating a semiconductor processing apparatus | Seiichiro Kanno, Ryoji Nishio, Ken Yoshioka, Hideki Kihara, Hideyuki Yamamoto | 2007-02-27 |
| 7138606 | Wafer processing method | Seiichiro Kanno, Ken Yoshioka, Ryoji Nishio, Hideki Kihara, Koji Okuda | 2006-11-21 |
| 6914207 | Plasma processing method | Tadayoshi Kawaguchi, Tadamitsu Kanekiyo, Akihiko Mitsuda, Takeshi Shimada | 2005-07-05 |
| 6895179 | Wafer stage for wafer processing apparatus | Seiichiro Kanno, Ken Yoshioka, Ryoji Nishio, Hideki Kihara, Koji Okuda | 2005-05-17 |
| 6867144 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Yutaka Ohmoto, Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi | 2005-03-15 |
| 6825617 | Semiconductor processing apparatus | Seiichiro Kanno, Ryoji Nishio, Ken Yoshioka, Hideki Kihara, Hideyuki Yamamoto | 2004-11-30 |
| 6759338 | Plasma processing apparatus and method | Yutaka Ohmoto, Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi | 2004-07-06 |
| 6756737 | Plasma processing apparatus and method | Akira Doi, Ken Yoshioka, Manabu Edamura, Hideyuki Kazumi, Tsutomu Tetsuka +3 more | 2004-06-29 |
| 6716301 | Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe | Seiichiro Kanno, Ryoji Nishio, Tsutomu Tetsuka, Junichi Tanaka, Hideyuki Yamamoto +1 more | 2004-04-06 |
| 6677167 | Wafer processing apparatus and a wafer stage and a wafer processing method | Seiichiro Kanno, Hironobu Kawahara, Mitsuru Suehiro, Toshio Masuda | 2004-01-13 |
| 6649021 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Yutaka Ohmoto, Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi | 2003-11-18 |
| 6646233 | Wafer stage for wafer processing apparatus and wafer processing method | Seiichiro Kanno, Ken Yoshioka, Ryoji Nishio, Hideki Kihara, Koji Okuda | 2003-11-11 |
| 6491832 | Method for processing specimens | Ken Yoshioka, Yoshimi Torii, Moriaki Fuyama, Tomohiro Okada, Takehito Usui +1 more | 2002-12-10 |
| 6413876 | Method for plasma processing high-speed semiconductor circuits with increased yield | Yutaka Ohmoto, Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi | 2002-07-02 |
| 6388382 | Plasma processing apparatus and method | Akira Doi, Ken Yoshioka, Manabu Edamura, Hideyuki Kazumi, Tsutomu Tetsuka +3 more | 2002-05-14 |
| 6172321 | Method and apparatus for plasma processing apparatus | Ken Yoshioka, Tetsunori Kaji, Ryoji Nishio, Manabu Edamura | 2001-01-09 |
| 6034346 | Method and apparatus for plasma processing apparatus | Ken Yoshioka, Tetsunori Kaji, Ryoji Nishio, Manabu Edamura | 2000-03-07 |