Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10796890 | Plasma processing apparatus and sample stage thereof | Hironori Kusumoto, Kazunori Nakamoto, Koji Nagai | 2020-10-06 |
| 10141165 | Plasma processing apparatus and sample stage thereof | Hironori Kusumoto, Kazunori Nakamoto, Koji Nagai | 2018-11-27 |
| 9384946 | Plasma processing apparatus | Kohei Sato, Kazunori Nakamoto | 2016-07-05 |
| 9150967 | Plasma processing apparatus and sample stage | Tomoyuki Watanabe, Mamoru Yakushiji | 2015-10-06 |
| 8282848 | Plasma processing method and plasma processing apparatus | Mamoru Yakushiji, Yutaka Kouzuma, Ken Yoshioka, Tsunehiko Tsubone | 2012-10-09 |
| 8092637 | Manufacturing method in plasma processing apparatus | Yutaka Kouzuma, Mamoru Yakushiji, Ken Yoshioka, Tsunehiko Tsubone | 2012-01-10 |
| 7608162 | Plasma processing apparatus and method | Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi, Saburou Kanai | 2009-10-27 |
| 7396481 | Etching method of organic insulating film | Michinobu Mizumura, Ryooji Fukuyama, Katsuya Watanabe | 2008-07-08 |
| 7288166 | Plasma processing apparatus | Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi, Saburou Kanai | 2007-10-30 |
| 7122479 | Etching processing method | Ryouji Fukuyama, Mamoru Yakushiji, Michinobu Mizumura | 2006-10-17 |
| 7026252 | Etching aftertreatment method | Michinobu Mizumura, Ryouji Fukuyama, Mamoru Yakushiji, Katsuya Watanabe | 2006-04-11 |
| 7014787 | Etching method of organic insulating film | Michinobu Mizumura, Ryooji Fukuyama, Katsuya Watanabe | 2006-03-21 |
| 7009714 | Method of dry etching a sample and dry etching system | Ryouji Fukuyama, Mamoru Yakushiji | 2006-03-07 |
| 6867144 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi, Saburou Kanai | 2005-03-15 |
| 6793833 | Etching method of organic insulating film | Michinobu Mizumura, Ryooji Fukuyama, Katsuya Watanabe | 2004-09-21 |
| 6759338 | Plasma processing apparatus and method | Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi, Saburou Kanai | 2004-07-06 |
| 6649021 | Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield | Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi, Saburou Kanai | 2003-11-18 |
| 6413876 | Method for plasma processing high-speed semiconductor circuits with increased yield | Hironobu Kawahara, Ken Yoshioka, Kazue Takahashi, Saburou Kanai | 2002-07-02 |
| 6328845 | Plasma-processing method and an apparatus for carrying out the same | Ryooji Fukuyama, Makoto Nawata | 2001-12-11 |