HK

Hironobu Kawahara

HI Hitachi: 36 patents #629 of 28,497Top 3%
HH Hitachi High-Technologies: 2 patents #968 of 1,917Top 55%
Overall (All Time): #83,497 of 4,157,543Top 3%
39
Patents All Time

Issued Patents All Time

Showing 1–25 of 39 patents

Patent #TitleCo-InventorsDate
7608162 Plasma processing apparatus and method Yutaka Ohmoto, Ken Yoshioka, Kazue Takahashi, Saburou Kanai 2009-10-27
7354525 Specimen surface processing apparatus and surface processing method Masatoshi Oyama, Yoshiyuki Ohta, Tsuyoshi Yoshida 2008-04-08
7288166 Plasma processing apparatus Yutaka Ohmoto, Ken Yoshioka, Kazue Takahashi, Saburou Kanai 2007-10-30
7132293 Method and apparatus for processing samples Yoshimi Torii, Kazuo Nojiri, Yoshinao Kawasaki, Yoshiaki Sato, Ryooji Fukuyama 2006-11-07
6989228 Method and apparatus for processing samples Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +5 more 2006-01-24
6867144 Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield Yutaka Ohmoto, Ken Yoshioka, Kazue Takahashi, Saburou Kanai 2005-03-15
6759338 Plasma processing apparatus and method Yutaka Ohmoto, Ken Yoshioka, Kazue Takahashi, Saburou Kanai 2004-07-06
6755935 Plasma processing apparatus Hideyuki Kazumi, Ichiro Sasaki, Kenji Maeda, Tsutomu Tetsuka 2004-06-29
6677167 Wafer processing apparatus and a wafer stage and a wafer processing method Seiichiro Kanno, Mitsuru Suehiro, Saburou Kanai, Toshio Masuda 2004-01-13
6656846 Apparatus for processing samples Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +4 more 2003-12-02
6649021 Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield Yutaka Ohmoto, Ken Yoshioka, Kazue Takahashi, Saburou Kanai 2003-11-18
6624084 Plasma processing equipment and plasma processing method using the same Kenji Maeda, Yutaka Omoto, Ichiro Sasaki 2003-09-23
6558100 Vacuum processing apparatus and a vacuum processing system Mitsuru Suehiro, Kazue Takahashi, Hideyuki Yamamoto, Katsuya Watanabe 2003-05-06
6549393 Semiconductor wafer processing apparatus and method Seiichiro Kanno, Mitsuru Suehiro, Saburo Kanai, Ken Yoshioka 2003-04-15
6537415 Apparatus for processing samples Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +5 more 2003-03-25
6537417 Apparatus for processing samples Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +5 more 2003-03-25
6537012 Vacuum processing apparatus and a vacuum processing system Mitsuru Suehiro, Kazue Takahashi, Hideyuki Yamamoto, Katsuya Watanabe 2003-03-25
6427621 Plasma processing device and plasma processing method Masato Ikegawa, Tsutomu Tetsuka, Ichiro Sasaki, Tatehito Usui 2002-08-06
6413876 Method for plasma processing high-speed semiconductor circuits with increased yield Yutaka Ohmoto, Ken Yoshioka, Kazue Takahashi, Saburou Kanai 2002-07-02
6388624 Parallel-planar plasma processing apparatus Hideyuki Kazumi 2002-05-14
6329298 Apparatus for treating samples Ryooji Fukuyama, Makoto Nawata, Yutaka Kakehi, Yoshiaki Sato, Yoshimi Torii +2 more 2001-12-11
6254721 Method and apparatus for processing samples Masayuki Kojima, Yoshimi Torii, Michimasa Hunabashi, Kazuyuki Suko, Takashi Yamada +5 more 2001-07-03
6235146 Vacuum treatment system and its stage Masanori Kadotani, Saburo Kanai, Youichi Itou, Takashi Fujii, Ryouji Hamasaki +2 more 2001-05-22
6165377 Plasma etching method and apparatus Yoshinao Kawasaki, Yoshiaki Sato, Ryooji Fukuyama 2000-12-26
6077788 Method and apparatus for processing samples Yoshinao Kawasaki, Yoshiaki Sato, Ryooji Fukuyama, Kazuo Nojiri, Yoshimi Torii 2000-06-20