MY

Motohiko Yoshigai

HI Hitachi: 25 patents #1,255 of 28,497Top 5%
HH Hitachi High-Technologies: 20 patents #98 of 1,917Top 6%
OJ Opnext Japan: 1 patents #100 of 185Top 55%
Overall (All Time): #73,815 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 1–25 of 42 patents

Patent #TitleCo-InventorsDate
9039865 Plasma processing apparatus Ken Yoshioka, Ryoji Nishio, Tadayoshi Kawaguchi 2015-05-26
8707899 Plasma processing apparatus Ryouta Kitani, Nobuhide Nunomura, Yasukiyo Morioka 2014-04-29
8282767 Plasma processing apparatus Naoshi Itabashi, Tsutomu Tetsuka, Seiichiro Kanno 2012-10-09
8071397 Semiconductor fabricating apparatus with function of determining etching processing state Tatehito Usui, Kazuhiro Jyouo, Tetsuo Ono 2011-12-06
7955514 Plasma processing apparatus and plasma processing method Kazue Takahashi, Hitoshi Tamura, Motohiro Tanaka 2011-06-07
7931776 Plasma processing apparatus Naoshi Itabashi, Tsutomu Tetsuka, Seiichiro Kanno 2011-04-26
7771607 Plasma processing apparatus and plasma processing method Tsutomu Tetsuka, Kazuyuki Ikenaga, Tetsuo Ono, Naoshi Itabashi 2010-08-10
7601241 Plasma processing apparatus and plasma processing method Tsutomu Tetsuka, Kazuyuki Ikenaga, Tetsuo Ono, Naoshi Itabashi 2009-10-13
7442651 Plasma etching method Masahito Mori, Toshiaki Nishida, Naoshi Itabashi, Hideyuki Kazumi, Kazutami Tago 2008-10-28
7411684 Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method Tatehito Usui, Takashi Fujii, Tetsunori Kaji 2008-08-12
7396771 Plasma etching apparatus and plasma etching method Go Miya, Seiichiro Kanno, Naoshi Itabashi, Junichi Tanaka, Masahito Mori +2 more 2008-07-08
7303998 Plasma processing method Tooru Aramaki, Tsunehiko Tsubone, Ryujiro Udo, Takashi Fujii 2007-12-04
7259104 Sample surface processing method Tetsuo Ono, Takafumi Tokunaga, Tadashi Umezawa, Tatsumi Mizutani, Tokuo Kure +3 more 2007-08-21
7259866 Semiconductor fabricating apparatus with function of determining etching processing state Tatehito Usui, Kazuhiro Jyouo, Tetsuo Ono 2007-08-21
7230720 Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method Tatehito Usui, Takashi Fujii, Tetsunori Kaji 2007-06-12
7224568 Plasma processing method and plasma processing apparatus Hiroaki Ishimura, Ken Yoshioka, Takahiro Abe, Go Saito 2007-05-29
7194821 Vacuum processing apparatus and vacuum processing method Manabu Edamura, Akitaka Makino, Takanori Nakatsuka, Susumu Tauchi 2007-03-27
7126697 Method and apparatus for determining endpoint of semiconductor element fabricating process Tatehito Usui, Takashi Fujii, Tetsunori Kaji, Hideyuki Yamamoto 2006-10-24
7098138 Plasma processing method for working the surface of semiconductor devices Takao Arase, Go Saito, Masamichi Sakaguchi, Hiroaki Ishimura, Takahiro Shimomura 2006-08-29
7049243 Surface processing method of a specimen and surface processing apparatus of the specimen Tetsuo Ono, Yasuhiro Nishimori, Takashi Sato, Naoyuki Kofuji, Masaru Izawa +7 more 2006-05-23
7009715 Method and apparatus for determining endpoint of semiconductor element fabricating process and method and apparatus for processing member to be processed Tatehito Usui, Takashi Fujii, Tetsunori Kaji, Hideyuki Yamamoto 2006-03-07
6972848 Semiconductor fabricating apparatus with function of determining etching processing state Tatehito Usui, Kazuhiro Jyouo, Tetsuo Ono 2005-12-06
6961131 Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method Tatehito Usui, Takashi Fujii, Tetsunori Kaji 2005-11-01
6916396 Etching system and etching method Akira Kagoshima, Hideyuki Yamamoto, Daisuke Shiraishi, Junichi Tanaka, Kenji Tamaki +1 more 2005-07-12
6903826 Method and apparatus for determining endpoint of semiconductor element fabricating process Tatehito Usui, Takashi Fujii, Tetsunori Kaji, Hideyuki Yamamoto 2005-06-07