Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6897403 | Plasma processing method and plasma processing apparatus | Ryujiro Udo, Masatsugu Arai, Masanori Kadotani | 2005-05-24 |
| 6838833 | Plasma processing apparatus | Masatsugu Arai, Ryujiro Udo, Naoyuki Tamura, Masanori Kadotani | 2005-01-04 |
| 6837937 | Plasma processing apparatus | Susumu Tauchi, Masanori Kadotani, Muneo Furuse | 2005-01-04 |
| 6815228 | Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method | Tatehito Usui, Takashi Fujii, Tetsunori Kaji | 2004-11-09 |
| 6743733 | Process for producing a semiconductor device including etching using a multi-step etching treatment having different gas compositions in each step | Hiroyuki Kitsunai, Junichi Tanaka, Takashi Fujii | 2004-06-01 |
| 6677244 | Specimen surface processing method | Tetsuo Ono, Yasuhiro Nishimori, Takashi Sato, Naoyuki Kofuji, Masaru Izawa +7 more | 2004-01-13 |
| 6664738 | Plasma processing apparatus | Masatsugu Arai, Ryujiro Udo, Naoyuki Tamura, Masanori Kadotani | 2003-12-16 |
| 6660647 | Method for processing surface of sample | Tetsuo Ono, Takafumi Tokunaga, Tadashi Umezawa, Tatsumi Mizutani, Tokuo Kure +3 more | 2003-12-09 |
| 6620737 | Plasma etching method | Go Saito, Masamichi Sakaguchi, Hitoshi Kobayashi, Satoshi Tani | 2003-09-16 |
| 6617255 | Plasma processing method for working the surface of semiconductor devices | Takao Arase, Go Saito, Masamichi Sakaguchi, Hiroaki Ishimura, Takahiro Shimomura | 2003-09-09 |
| 6492277 | Specimen surface processing method and apparatus | Tetsuo Ono, Yasuhiro Nishimori, Takashi Sato, Naoyuki Kofuji, Masaru Izawa +7 more | 2002-12-10 |
| 6235146 | Vacuum treatment system and its stage | Masanori Kadotani, Saburo Kanai, Youichi Itou, Takashi Fujii, Hironobu Kawahara +2 more | 2001-05-22 |
| 6191045 | Method of treating surface of sample | Hiroshi Hasegawa, Hiroshi Akiyama, Takafumi Tokunaga, Tadashi Umezawa, Masayuki Kojima +3 more | 2001-02-20 |
| 6046425 | Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber | Tetsunori Kaji, Takashi Fujii, Yoshinao Kawasaki, Masaharu Nishiumi | 2000-04-04 |
| 5681424 | Plasma processing method | Go Saito, Kenji Fujimoto | 1997-10-28 |
| 5432315 | Plasma process apparatus including ground electrode with protection film | Tetsunori Kaji, Takashi Fujii, Yoshinao Kawasaki, Masaharu Nishiumi | 1995-07-11 |
| 5290993 | Microwave plasma processing device | Tetsunori Kaji, Takashi Fujii, Yoshinao Kawasaki, Masaharu Nishiumi | 1994-03-01 |