Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10153128 | Charged particle beam apparatus and sample elevating apparatus | Masakazu Sugaya, Yusuke Moriwaki, Koichi Terada, Nobuo Shibata, Hironori Ogawa +2 more | 2018-12-11 |
| 8921781 | Measurement or inspecting apparatus | Go Miya, Seiichiro Kanno, Masaru Matsushima, Toru Shuto | 2014-12-30 |
| 8680466 | Electron microscope, and specimen holding method | Seiichiro Kanno, Masaru Matsushima, Toru Shuto, Kazuyuki Ikenaga | 2014-03-25 |
| 8653459 | Scanning electron microscope | Seiichiro Kanno, Masaru Matsushima | 2014-02-18 |
| 8653455 | Charged particle beam device and evaluation method using the charged particle beam device | Seiichiro Kanno, Masaru Matsushima, Shuichi Nakagawa, Go Miya | 2014-02-18 |
| 8519332 | Semiconductor inspecting apparatus | Go Miya, Seiichiro Kanno, Masaru Matsushima, Toru Shuto | 2013-08-27 |
| 8232522 | Semiconductor inspecting apparatus | Go Miya, Seiichiro Kanno, Masaru Matsushima, Toru Shuto | 2012-07-31 |
| 7601240 | Disturbance-free, recipe-controlled plasma processing system and method | Akira Kagoshima, Hideyuki Yamamoto, Shoji Ikuhara, Toshio Masuda, Junichi Tanaka +2 more | 2009-10-13 |
| 7567422 | Plasma processing apparatus and plasma processing method | Seiichiro Kanno, Tsunehiko Tsubone | 2009-07-28 |
| 7473332 | Method for processing semiconductor | Junichi Tanaka, Hideyuki Yamamoto, Akira Kagoshima, Daisuke Shiraishi | 2009-01-06 |
| 7376479 | Process monitoring device for sample processing apparatus and control method of sample processing apparatus | Junichi Tanaka, Hideyuki Yamamoto, Shoji Ikuhara, Kazue Takahashi | 2008-05-20 |
| 7343217 | System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation | Junichi Tanaka, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto, Shoji Ikuhara +1 more | 2008-03-11 |
| 7158848 | Process monitoring device for sample processing apparatus and control method of sample processing apparatus | Junichi Tanaka, Hideyuki Yamamoto, Shoji Ikuhara, Kazue Takahashi | 2007-01-02 |
| 7147748 | Plasma processing method | Go Miya, Junichi Tanaka, Toshio Masuda, Hideyuki Yamamoto | 2006-12-12 |
| 7147747 | Plasma processing apparatus and plasma processing method | Go Miya, Junichi Tanaka, Toshio Masuda, Hideyuki Yamamoto | 2006-12-12 |
| 7122096 | Method and apparatus for processing semiconductor | Junichi Tanaka, Hideyuki Yamamoto, Akira Kagoshima, Daisuke Shiraishi | 2006-10-17 |
| 7058470 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor | Junichi Tanaka, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto, Shoji Ikuhara +1 more | 2006-06-06 |
| 7058467 | Process monitoring device for sample processing apparatus and control method of sample processing apparatus | Junichi Tanaka, Hideyuki Yamamoto, Shoji Ikuhara, Kazue Takahashi | 2006-06-06 |
| 6939435 | Plasma processing apparatus and processing method | Junichi Tanaka, Hideyuki Yamamoto, Shoji Ikuhara, Akira Kagoshima | 2005-09-06 |
| 6881352 | Disturbance-free, recipe-controlled plasma processing method | Akira Kagoshima, Hideyuki Yamamoto, Shoji Ikuhara, Toshio Masuda, Junichi Tanaka +2 more | 2005-04-19 |
| 6879867 | Process monitoring device for sample processing apparatus and control method of sample processing apparatus | Junichi Tanaka, Hideyuki Yamamoto, Shoji Ikuhara, Kazue Takahashi | 2005-04-12 |
| 6828165 | Semiconductor plasma processing apparatus with first and second processing state monitoring units | Junichi Tanaka, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto, Shoji Ikuhara +1 more | 2004-12-07 |
| 6747239 | Plasma processing apparatus and method | Junichi Tanaka, Ryoji Nishio, Seiichiro Kanno, Hideyuki Yamamoto | 2004-06-08 |
| 6743733 | Process for producing a semiconductor device including etching using a multi-step etching treatment having different gas compositions in each step | Junichi Tanaka, Takashi Fujii, Motohiko Yoshigai | 2004-06-01 |
| 6733618 | Disturbance-free, recipe-controlled plasma processing system and method | Akira Kagoshima, Hideyuki Yamamoto, Shoji Ikuhara, Toshio Masuda, Junichi Tanaka +2 more | 2004-05-11 |