Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1094319 | Upper chamber for a plasma processing device | Koji Nagai, Tadayoshi Kawaguchi, Kohei Sato | 2025-09-23 |
| 12266508 | Plasma processing apparatus and method for venting a processing chamber to atmosphere | Masaru Matsuzaki | 2025-04-01 |
| 12191121 | Plasma processing apparatus | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone | 2025-01-07 |
| 12112925 | Plasma processing apparatus | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2024-10-08 |
| 11987880 | Manufacturing method and inspection method of interior member of plasma processing apparatus | Kazuhiro Ueda, Masaru Kurihara, Tomoyuki Tamura | 2024-05-21 |
| 11664233 | Method for releasing sample and plasma processing apparatus using same | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2023-05-30 |
| 11424108 | Plasma processing apparatus | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone | 2022-08-23 |
| 11315792 | Plasma processing apparatus and plasma processing method | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2022-04-26 |
| 11257661 | Plasma processing apparatus | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2022-02-22 |
| 11107694 | Method for releasing sample and plasma processing apparatus using same | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2021-08-31 |
| 10886106 | Plasma processing apparatus and method for venting a processing chamber to atmosphere | Masaru Matsuzaki | 2021-01-05 |
| 10490412 | Method for releasing sample and plasma processing apparatus using same | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2019-11-26 |
| 10395935 | Plasma processing apparatus and plasma processing method | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2019-08-27 |
| 9941133 | Plasma processing apparatus and plasma processing method | Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Tomoyuki Tamura | 2018-04-10 |
| 9607874 | Plasma processing apparatus | Hiroyuki Kobayashi, Tomoyuki Tamura, Masaki Ishiguro, Shigeru Shirayone, Makoto Nawata | 2017-03-28 |
| 8680466 | Electron microscope, and specimen holding method | Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto | 2014-03-25 |
| 8024831 | Cleaning method | Tsutomu Tetsuka, Muneo Furuse | 2011-09-27 |
| 8006340 | Cleaning apparatus | Tsutomu Tetsuka, Muneo Furuse | 2011-08-30 |
| 7771607 | Plasma processing apparatus and plasma processing method | Tsutomu Tetsuka, Tetsuo Ono, Motohiko Yoshigai, Naoshi Itabashi | 2010-08-10 |
| 7601241 | Plasma processing apparatus and plasma processing method | Tsutomu Tetsuka, Tetsuo Ono, Motohiko Yoshigai, Naoshi Itabashi | 2009-10-13 |
| 6911157 | Plasma processing method and apparatus using dynamic sensing of a plasma environment | Manabu Edamura, Hideyuki Yamamoto | 2005-06-28 |
| 6850012 | Plasma processing apparatus | Manabu Edamura, Ken Yoshioka, Akitaka Makino | 2005-02-01 |
| 6793768 | Plasma-assisted processing apparatus | Hideyuki Kazumi, Manabu Edamura, Atsushi Ootake | 2004-09-21 |
| 6716301 | Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe | Seiichiro Kanno, Ryoji Nishio, Tsutomu Tetsuka, Junichi Tanaka, Hideyuki Yamamoto +1 more | 2004-04-06 |