SI

Shoji Ikuhara

HI Hitachi: 23 patents #1,433 of 28,497Top 6%
HH Hitachi High-Technologies: 15 patents #165 of 1,917Top 9%
📍 Hikari, JP: #3 of 125 inventorsTop 3%
Overall (All Time): #94,321 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 1–25 of 36 patents

Patent #TitleCo-InventorsDate
10262840 Plasma processing apparatus Akira Kagoshima, Daisuke Shiraishi, Satomi Inoue, Shigeru Nakamoto, Toshihiro Morisawa 2019-04-16
9230782 Plasma processing method and apparatus Eiji Ikegami, Takeshi Shimada, Kenichi Kuwabara, Takao Arase, Tsuyoshi Matsumoto 2016-01-05
8992721 Plasma processing apparatus Akira Kagoshima, Daisuke Shiraishi, Satomi Inoue, Shigeru Nakamoto, Toshihiro Morisawa 2015-03-31
8900401 Plasma processing method and apparatus Eiji Ikegami, Takeshi Shimada, Kenichi Kuwabara, Takao Arase, Tsuyoshi Matsumoto 2014-12-02
8282849 Etching process state judgment method and system therefor Toshihiro Morisawa, Akira Kagoshima, Daisuke Shiraishi 2012-10-09
8083960 Etching endpoint determination method Hiroshige Uchida, Daisuke Shiraishi, Akira Kagoshima 2011-12-27
8038896 Plasma processing method and apparatus Eiji Ikegami, Takeshi Shimada, Kenichi Kuwabara, Takao Arase, Tsuyoshi Matsumoto 2011-10-18
7601240 Disturbance-free, recipe-controlled plasma processing system and method Akira Kagoshima, Hideyuki Yamamoto, Toshio Masuda, Hiroyuki Kitsunai, Junichi Tanaka +2 more 2009-10-13
7376479 Process monitoring device for sample processing apparatus and control method of sample processing apparatus Junichi Tanaka, Hiroyuki Kitsunai, Hideyuki Yamamoto, Kazue Takahashi 2008-05-20
7343217 System for monitoring and controlling a semiconductor manufacturing apparatus using prediction model equation Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto +1 more 2008-03-11
7330346 Etching apparatus, method for measuring self-bias voltage, and method for monitoring etching apparatus Hideyuki Yamamoto, Daisuke Shiraishi, Akira Kagoshima 2008-02-12
7158848 Process monitoring device for sample processing apparatus and control method of sample processing apparatus Junichi Tanaka, Hiroyuki Kitsunai, Hideyuki Yamamoto, Kazue Takahashi 2007-01-02
7107115 Method for controlling semiconductor processing apparatus Junichi Tanaka, Hideyuki Yamamoto, Akira Kagoshima 2006-09-12
7062347 Maintenance method and system for plasma processing apparatus Hideyuki Yamamoto, Toshio Masuda, Akira Kagoshima, Junichi Tanaka 2006-06-13
7058467 Process monitoring device for sample processing apparatus and control method of sample processing apparatus Junichi Tanaka, Hiroyuki Kitsunai, Hideyuki Yamamoto, Kazue Takahashi 2006-06-06
7058470 Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto +1 more 2006-06-06
7010374 Method for controlling semiconductor processing apparatus Junichi Tanaka, Hideyuki Yamamoto, Akira Kagoshima 2006-03-07
6939433 Sample processing apparatus and sample processing system Hideyuki Yamamoto 2005-09-06
6941185 Operating method of vacuum processing system and vacuum processing system Kouji Nishihata, Kazuhiro Joo, Tetsuya Tahara, Shoji Okiguchi 2005-09-06
6939435 Plasma processing apparatus and processing method Junichi Tanaka, Hiroyuki Kitsunai, Hideyuki Yamamoto, Akira Kagoshima 2005-09-06
6908529 Plasma processing apparatus and method Hideyuki Yamamoto, Akira Kagoshima, Daisuke Shiraishi, Junichi Tanaka 2005-06-21
6885906 Operating method of vacuum processing system and vacuum processing system Kouji Nishihata, Kazuhiro Joo, Tetsuya Tahara, Shoji Okiguchi 2005-04-26
6881352 Disturbance-free, recipe-controlled plasma processing method Akira Kagoshima, Hideyuki Yamamoto, Toshio Masuda, Hiroyuki Kitsunai, Junichi Tanaka +2 more 2005-04-19
6879867 Process monitoring device for sample processing apparatus and control method of sample processing apparatus Junichi Tanaka, Hiroyuki Kitsunai, Hideyuki Yamamoto, Kazue Takahashi 2005-04-12
6853872 Operating method of vacuum processing system and vacuum processing system Kouji Nishihata, Kazuhiro Joo, Tetsuya Tahara, Shoji Okiguchi 2005-02-08