Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6841032 | Plasma processing apparatus for adjusting plasma processing through detecting plasma processing state within chamber | Junichi Tanaka, Hideyuki Yamamoto | 2005-01-11 |
| 6828165 | Semiconductor plasma processing apparatus with first and second processing state monitoring units | Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto +1 more | 2004-12-07 |
| 6776872 | Data processing apparatus for semiconductor processing apparatus | Junichi Tanaka, Toshio Masuda, Akira Kagoshima, Hideyuki Yamamoto | 2004-08-17 |
| 6745096 | Maintenance method and system for plasma processing apparatus etching and apparatus | Hideyuki Yamamoto, Toshio Masuda, Akira Kagoshima, Junichi Tanaka | 2004-06-01 |
| 6733618 | Disturbance-free, recipe-controlled plasma processing system and method | Akira Kagoshima, Hideyuki Yamamoto, Toshio Masuda, Hiroyuki Kitsunai, Junichi Tanaka +2 more | 2004-05-11 |
| 6714832 | Operating method of vacuum processing system and vacuum processing system | Kouji Nishihata, Kazuhiro Joo, Tetsuya Tahara, Shoji Okiguchi | 2004-03-30 |
| 6706543 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a therefor | Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamoto +1 more | 2004-03-16 |
| 6616759 | Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor | Junichi Tanaka, Hiroyuki Kitsunai, Akira Kagoshima, Daisuke Shiraishi, Hideyuki Yamamato +1 more | 2003-09-09 |
| 6596551 | Etching end point judging method, etching end point judging device, and insulating film etching method using these methods | Tatehito Usui, Ken Yoshioka, Kouji Nishihata, Kazue Takahashi, Tetsunori Kaji +1 more | 2003-07-22 |
| 6069096 | Operating method of vacuum processing system and vacuum processing system | Kouji Nishihata, Kazuhiro Joo, Tetsuya Tahara, Shoji Okiguchi | 2000-05-30 |
| 4936967 | Method of detecting an end point of plasma treatment | Keiji Tada, Yoshinao Kawasaki, Katsuyoshi Kudo, Minoru Soraoka | 1990-06-26 |