Issued Patents All Time
Showing 1–25 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12014909 | Plasma processing apparatus and plasma processing system | Ryoji Asakura, Shota Umeda, Daisuke Shiraishi, Satomi Inoue | 2024-06-18 |
| 11643727 | Plasma processing apparatus | Daisuke Shiraishi, Yuji Nagatani | 2023-05-09 |
| 11538671 | Plasma processing apparatus and data analysis apparatus | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi, Masahiro Sumiya | 2022-12-27 |
| 11410836 | Analysis method and semiconductor etching apparatus | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi | 2022-08-09 |
| 11404253 | Plasma processing apparatus and analysis method for analyzing plasma processing data | Ryoji Asakura, Daisuke Shiraishi, Satomi Inoue | 2022-08-02 |
| 11289313 | Plasma processing apparatus | Shota Umeda, Keita Nogi, Daisuke Shiraishi | 2022-03-29 |
| 10872750 | Plasma processing apparatus and plasma processing system | Ryoji Asakura, Shota Umeda, Daisuke Shiraishi, Satomi Inoue | 2020-12-22 |
| 10734207 | Plasma processing apparatus and analysis method for analyzing plasma processing data | Ryoji Asakura, Daisuke Shiraishi, Satomi Inoue | 2020-08-04 |
| 10510519 | Plasma processing apparatus and data analysis apparatus | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi, Masahiro Sumiya | 2019-12-17 |
| 10408762 | Plasma processing apparatus, plasma processing method and plasma processing analysis method | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi, Satomi Inoue | 2019-09-10 |
| 10262840 | Plasma processing apparatus | Daisuke Shiraishi, Satomi Inoue, Shigeru Nakamoto, Shoji Ikuhara, Toshihiro Morisawa | 2019-04-16 |
| 10262842 | Analysis method and semiconductor etching apparatus | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi | 2019-04-16 |
| 10184182 | Plasma processing apparatus | Daisuke Shiraishi, Yuji Nagatani | 2019-01-22 |
| 10153217 | Plasma processing apparatus and plasma processing method | Daisuke Shiraishi, Yuji Nagatani, Satomi Inoue | 2018-12-11 |
| 9824866 | Plasma processing method | Daisuke Shiraishi, Yuji Nagatani | 2017-11-21 |
| 9464936 | Plasma processing apparatus and analyzing apparatus | Ryoji Asakura, Daisuke Shiraishi, Kenji Tamaki | 2016-10-11 |
| 9443704 | Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi | 2016-09-13 |
| 9324588 | Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi | 2016-04-26 |
| 9110461 | Semiconductor manufacturing equipment | Toshihiro Morisawa, Daisuke Shiraishi, Satomi Inoue | 2015-08-18 |
| 9091595 | Analysis method, analysis device, and etching processing system | Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi, Toshio Masuda | 2015-07-28 |
| 8992721 | Plasma processing apparatus | Daisuke Shiraishi, Satomi Inoue, Shigeru Nakamoto, Shoji Ikuhara, Toshihiro Morisawa | 2015-03-31 |
| 8924001 | Etching apparatus, control simulator, and semiconductor device manufacturing method | Toshihiro Morisawa, Daisuke Shiraishi, Satomi Inoue | 2014-12-30 |
| 8828184 | Plasma processing apparatus and plasma processing method | Daisuke Shiraishi, Yuji Nagatani | 2014-09-09 |
| 8784677 | Plasma processing apparatus and plasma processing method | Daisuke Shiraishi, Satomi Inoue, Shigeru Nakamoto | 2014-07-22 |
| 8731706 | Vacuum processing apparatus | Shingo Kimura, Shouji Okiguchi, Shinji Obama | 2014-05-20 |