| 8486291 |
Plasma processing method |
Takeshi Ohmori, Yasuhiro Nishimori, Hiroaki Ishimura, Hitoshi Kobayashi |
2013-07-16 |
| 8277563 |
Plasma processing method |
Masunori Ishihara, Yasuhiro Nishimori, Yutaka Kudou, Satoshi Une |
2012-10-02 |
| 8262801 |
Vacuum processing method |
Ken Kitaoka, Kazue Takahasi |
2012-09-11 |
| 8216420 |
Plasma processing apparatus |
Hideyuki Kazumi, Akihiro Sano, Akitaka Makino, Hitoshi Tamura |
2012-07-10 |
| 8143175 |
Dry etching method |
Satoshi Une, Kenichi Kuwabara, Tomoyoshi Ichimaru |
2012-03-27 |
| 7913646 |
Vacuum processing apparatus and vacuum processing method |
Ken Kitaoka, Kazue Takahasi |
2011-03-29 |
| 7909933 |
Plasma processing method |
Masunori Ishihara, Yasuhiro Nishimori, Yutaka Kudou, Satoshi Une |
2011-03-22 |
| 7098138 |
Plasma processing method for working the surface of semiconductor devices |
Takao Arase, Motohiko Yoshigai, Go Saito, Hiroaki Ishimura, Takahiro Shimomura |
2006-08-29 |
| 6919274 |
LSI device etching method and apparatus thereof |
Hideyuki Kazumi, Tsuyoshi Yoshida, Eiji Ikegami, Kouichi Nakaune, Yasuyuki Miyamoto +1 more |
2005-07-19 |
| 6709984 |
Method for manufacturing semiconductor device |
Go Saito, Hiroaki Ishimura, Yutaka Kudoh, Kazuo Takata |
2004-03-23 |
| 6620737 |
Plasma etching method |
Go Saito, Hitoshi Kobayashi, Motohiko Yoshigai, Satoshi Tani |
2003-09-16 |
| 6617255 |
Plasma processing method for working the surface of semiconductor devices |
Takao Arase, Motohiko Yoshigai, Go Saito, Hiroaki Ishimura, Takahiro Shimomura |
2003-09-09 |