KK

Kohei Kawamura

TL Tokyo Electron Limited: 29 patents #135 of 5,567Top 3%
HH Hitachi High-Technologies: 6 patents #1,282 of 1,917Top 70%
KA Kaneka: 5 patents #246 of 1,525Top 20%
UN Unknown: 3 patents #7,366 of 83,584Top 9%
Canon: 2 patents #12,681 of 19,416Top 70%
NU National University Corporation Tohoku University: 1 patents #86 of 170Top 55%
NC Nihon Spindle Manufacturing Co.: 1 patents #17 of 47Top 40%
ZE Zeon: 1 patents #435 of 734Top 60%
TL Tokyo Electron Yamanashi Limited: 1 patents #52 of 138Top 40%
RK Rikagaku Kenkyusho: 1 patents #70 of 207Top 35%
TC Takuma Co.: 1 patents #16 of 71Top 25%
📍 Settsu, OR: #1 of 1 inventorsTop 100%
Overall (All Time): #67,527 of 4,157,543Top 2%
44
Patents All Time

Issued Patents All Time

Showing 26–44 of 44 patents

Patent #TitleCo-InventorsDate
7612000 Modacrylic shrinkable fiber and method for manufacturing the same Sohei Nishida, Toshiaki Ebisu 2009-11-03
7601402 Method for forming insulation film and apparatus for forming insulation film Yusaku Kashiwagi, Yoshihisa Kagawa, Gishi Chung 2009-10-13
7307019 Method for supercritical carbon dioxide processing of fluoro-carbon films Akira Asano, Koutarou Miyatani, Joseph T. Hillman, Bentley J. Palmer 2007-12-11
7186806 Process for producing regenerated collagen fiber and process for setting the same Takashi Ueda, Takeshi Chiba 2007-03-06
6949829 Semiconductor device and fabrication method therefor Takashi Akahori, Gishi Chung 2005-09-27
6311908 Crushing method for waste containing materials unfit for crushing and apparatus for its practice Takao Kajiyama, Ryozou Kushida, Hiroshi Arito 2001-11-06
6155200 ECR plasma generator and an ECR system using the generator Yasuhiro Horiike 2000-12-05
5958258 Plasma processing method in semiconductor processing system Hiroyuki Ishihara 1999-09-28
5531834 Plasma film forming method and apparatus and plasma processing apparatus Shuichi Ishizuka, Jiro Hata, Akira Suzuki 1996-07-02
5522934 Plasma processing apparatus using vertical gas inlets one on top of another Akira Suzuki, Shuichi Ishizuka, Jiro Hata 1996-06-04
5476182 Etching apparatus and method therefor Shuichi Ishizuka, Jiro Hata 1995-12-19
5308791 Method and apparatus for processing surface of semiconductor layer Yasuhiro Horiike 1994-05-03
5290609 Method of forming dielectric film for semiconductor devices Yasuhiro Horiike 1994-03-01
5252892 Plasma processing apparatus Akira Koshiishi, Masahiko Matsudo, Naoki Takayama 1993-10-12
5101110 Ion generator Masahiko Matsudo, Akira Koshiishi, Naoki Takayama 1992-03-31
5089747 Electron beam excitation ion source Akira Koshiishi, Naoki Takayama 1992-02-18
5083061 Electron beam excited ion source Akira Koshiishi 1992-01-21
5028791 Electron beam excitation ion source Akira Koshiishi, Masahiko Matsudo, Naoki Takayama 1991-07-02
4749912 Ion-producing apparatus Tamio Hara, Manabu Hamagaki, Yoshinobu Aoyagi, Susumu Namba, Nobuo Ishii +1 more 1988-06-07