Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6727182 | Process for the production of semiconductor device | Takashi Akahori, Shunichi Endo, Takeshi Aoki, Tadashi Hirata | 2004-04-27 |
| 6537904 | Method for manufacturing a semiconductor device having a fluorine containing carbon inter-layer dielectric film | — | 2003-03-25 |
| 6443165 | Method for cleaning plasma treatment device and plasma treatment system | Takashi Akahori, Masaki Tozawa, Yoko Naito, Risa Nakase, Masahide Saito +1 more | 2002-09-03 |
| 6419985 | Method for producing insulator film | — | 2002-07-16 |
| 6355902 | Plasma film forming method and plasma film forming apparatus | Takashi Akahori, Masaki Tozawa, Yoko Naito, Risa Nakase, Osamu Yokoyama +4 more | 2002-03-12 |
| 6215087 | Plasma film forming method and plasma film forming apparatus | Takashi Akahori, Masaki Tozawa, Yoko Naito, Risa Nakase, Osamu Yokoyama +4 more | 2001-04-10 |
| 6087614 | Plasma treating device | Risa Nakase, Takeshi Aoki | 2000-07-11 |
| 5531834 | Plasma film forming method and apparatus and plasma processing apparatus | Kohei Kawamura, Jiro Hata, Akira Suzuki | 1996-07-02 |
| 5522934 | Plasma processing apparatus using vertical gas inlets one on top of another | Akira Suzuki, Kohei Kawamura, Jiro Hata | 1996-06-04 |
| 5476182 | Etching apparatus and method therefor | Kohei Kawamura, Jiro Hata | 1995-12-19 |