Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5627626 | Projectin exposure apparatus | Soichi Inoue, Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi | 1997-05-06 |
| 5621498 | Projection exposure apparatus | Soichi Inoue, Tadahito Fujisawa, Shin Ito, Takashi Sato, Shuichi Tamamushi | 1997-04-15 |
| 5607599 | Method of processing a magnetic thin film | Katsutaro Ichihara, Michiko Okubo | 1997-03-04 |
| 5543252 | Method for manufacturing exposure mask and the exposure mask | Tsuyoshi Shibata, Koji Hashimoto, Katsuhiko Heida, Kenji Kawano, Shinichi Ito | 1996-08-06 |
| 5474643 | Plasma processing apparatus | Junichi Arami, Tamio Endo, Shiro Koyama, Kazuo Kikuchi, Teruaki Shiraishi +3 more | 1995-12-12 |
| 5445710 | Method of manufacturing semiconductor device | Masaru Hori, Hiroyuki Yano, Hisataka Hayashi, Sadayuki Jimbo, Haruo Okano +3 more | 1995-08-29 |
| 5444207 | Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field | Makoto Sekine, Haruo Okano, Katsuya Okumura, Isahiro Hasegawa, Masaki Narita | 1995-08-22 |
| 5437961 | Method of manufacturing semiconductor device | Hiroyuki Yano, Haruo Okano, Tohru Watanabe | 1995-08-01 |
| 5429730 | Method of repairing defect of structure | Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, Mitsuyo Kariya, Soichi Inoue +7 more | 1995-07-04 |
| 5376211 | Magnetron plasma processing apparatus and processing method | Hiromi Harada, Sinji Kubota, Hiromi Kumagai, Junichi Arami, Isahiro Hasegawa +3 more | 1994-12-27 |
| 5356515 | Dry etching method | Yoshifumi Tahara, Yoshihisa Hirano, Masahiro Ogasawara, Isahiro Hasegawa, Takaya Matsushita | 1994-10-18 |
| 5320704 | Plasma etching apparatus | Yukimasa Yoshida, Shiro Koyama | 1994-06-14 |
| 5310454 | Dry etching method | Tokuhisa Ohiwa, Hisataka Hayashi, Haruo Okano, Takaya Matsushita, Isahiro Hasegawa +1 more | 1994-05-10 |
| 5302240 | Method of manufacturing semiconductor device | Masaru Hori, Hiroyuki Yano, Hisataka Hayashi, Sadayuki Jimbo, Haruo Okano +3 more | 1994-04-12 |
| 5302236 | Method of etching object to be processed including oxide or nitride portion | Yoshifumi Tahara, Yoshihisa Hirano, Isahiro Hasegawa | 1994-04-12 |
| 5298112 | Method for removing composite attached to material by dry etching | Nobuo Hayasaka, Tsunetoshi Arikado, Haruo Okano | 1994-03-29 |
| 5290381 | Plasma etching apparatus | Toshihisa Nozawa, Junichi Arami, Isahiro Hasegawa | 1994-03-01 |
| 5271788 | Plasma processing apparatus | Makoto Hasegawa, Takaya Matsushita, Isahiro Hasegawa, Toshihisa Nozawa, Yoshio Ishikawa +2 more | 1993-12-21 |
| 5270266 | Method of adjusting the temperature of a semiconductor wafer | Yoshihisa Hirano, Yoshifumi Tahara, Isahiro Hasegawa | 1993-12-14 |
| 5259923 | Dry etching method | Masaru Hori, Haruo Okano, Masao Ito, Masahito Hiratsuka, Yoshio Ishikawa | 1993-11-09 |
| 5258332 | Method of manufacturing semiconductor devices including rounding of corner portions by etching | Haruo Okano, Hirotaka Nishino | 1993-11-02 |
| 5250137 | Plasma treating apparatus | Junichi Arami, Toshihisa Nozawa, Katsuya Okumura | 1993-10-05 |
| 5240554 | Method of manufacturing semiconductor device | Masaru Hori, Hiroyuki Yano, Hisataka Hayashi, Sadayuki Jimbo, Haruo Okano | 1993-08-31 |
| 5234527 | Liquid level detecting device and a processing apparatus | Toshihisa Nozawa, Junichi Arami, Yukimasa Yoshida | 1993-08-10 |
| 4595601 | Method of selectively forming an insulation layer | Haruo Okano, Makoto Sekine | 1986-06-17 |