Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of real time in-situ chamber condition monitoring using sensors and RF communication

Method of real time in-situ chamber condition monitoring using sensors and RF communication

US Patent 10141166 · Granted Nov 27, 2018

Estimated economic value: $52,277,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for digital control of ion energy distribution in a plasma2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Method for forming integrated circuit structures2025
Methods and apparatus for processing a substrate2025
Radio-frequency (RF) matching network for fast impedance tuning2025
Wafer to baseplate arc prevention using textured dielectric2025
Inductively coupled plasma source with radial coil network2025
Auxiliary plasma source for robust ignition and restrikes in a plasma chamber2025
Ion energy control on electrodes in a plasma reactor2025
Ion energy control on electrodes in a plasma reactor2025
Pulsed voltage source for plasma processing applications2025
Pulsed voltage source for plasma processing applications2025