LW

Lawrence Wong

IN Intel: 22 patents #1,785 of 30,777Top 6%
Applied Materials: 21 patents #612 of 7,310Top 9%
SW Sirific Wireless: 3 patents #2 of 17Top 15%
Nokia: 1 patents #2,812 of 5,652Top 50%
📍 Fremont, CA: #254 of 9,298 inventorsTop 3%
🗺 California: #8,766 of 386,348 inventorsTop 3%
Overall (All Time): #60,671 of 4,157,543Top 2%
47
Patents All Time

Issued Patents All Time

Showing 26–47 of 47 patents

Patent #TitleCo-InventorsDate
7354862 Thin passivation layer on 3D devices Grant Kloster, Lawrence Foley 2008-04-08
7214594 Method of making semiconductor device using a novel interconnect cladding layer Jihperng Leu, Grant Kloster, Andrew Ott, Patrick Morrow 2007-05-08
7215931 Method and apparatus for up-and-down-conversion of radio frequency (RF) signals Chris Snyder, Tajinder Manku, Gareth Pryce Weale 2007-05-08
7192856 Forming dual metal complementary metal oxide semiconductor integrated circuits Mark L. Doczy, Valery M. Dubin, Justin K. Brask, Jack T. Kavalieros, Suman Datta +2 more 2007-03-20
7164206 Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer Grant Kloster, Jihperng Leu, Andrew Ott, Patrick Marrow 2007-01-16
7115995 Structural reinforcement of highly porous low k dielectric films by Cu diffusion barrier structures 2006-10-03
7046980 Method and apparatus for up-and down-conversion of radio frequency (RF) signals Tajinder Manku, Chris Snyder, Gareth Pryce Weale 2006-05-16
6992391 Dual-damascene interconnects without an etch stop layer by alternating ILDs Andrew Ott, Patrick Morrow, Jihperng Leu, Grant Kloster 2006-01-31
6984581 Structural reinforcement of highly porous low k dielectric films by ILD posts 2006-01-10
6973297 Method and apparatus for down-conversion of radio frequency (RF) signals with reduced local oscillator leakage Tajinder Manku, Yang Ling 2005-12-06
6846737 Plasma induced depletion of fluorine from surfaces of fluorinated low-k dielectric materials Steven Towle, Ebrahim Andideh 2005-01-25
6734533 Electron-beam treated CDO films 2004-05-11
6703324 Mechanically reinforced highly porous low dielectric constant films 2004-03-09
6593650 Plasma induced depletion of fluorine from surfaces of fluorinated low-k dielectric materials Steven Towle, Ebrahim Andideh 2003-07-15
6566757 Stabilization of low dielectric constant film with in situ capping layer Indrajit Banerjee, Marnie L. Harker 2003-05-20
6472315 Method of via patterning utilizing hard mask and stripping patterning material at low temperature Phi L. Nguyen 2002-10-29
6432811 Method of forming structural reinforcement of highly porous low k dielectric films by Cu diffusion barrier structures 2002-08-13
6417098 Enhanced surface modification of low K carbon-doped oxide Donald Danielson, Sarah Bowen, Ebrahim Andideh 2002-07-09
6284091 Unique chemical mechanical planarization approach which utilizes magnetic slurry for polish and magnetic fields for process control 2001-09-04
6083839 Unique chemical mechanical planarization approach which utilizes magnetic slurry for polish and magnetic fields for process control 2000-07-04
6057226 Air gap based low dielectric constant interconnect structure and method of making same 2000-05-02
5946601 Unique .alpha.-C:N:H/.alpha.-C:N.sub.x film liner/barrier to prevent fluorine outdiffusion from .alpha.-FC chemical vapor deposition dielectric layers Indrajit Banerjee, Steven Towie 1999-08-31