| 8399317 |
Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate, and method therefor |
Sean King, Ajay Sharma |
2013-03-19 |
| 8120114 |
Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate |
Sean King, Ajay Sharma |
2012-02-21 |
| 7790631 |
Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal |
Ajay Sharma, Sean King, Dennis G. Hanken |
2010-09-07 |
| 7214594 |
Method of making semiconductor device using a novel interconnect cladding layer |
Lawrence Wong, Jihperng Leu, Grant Kloster, Patrick Morrow |
2007-05-08 |
| 7199473 |
Integrated low-k hard mask |
Sean King |
2007-04-03 |
| 7169715 |
Forming a dielectric layer using porogens |
Grant Kloster, Robert Meagley, Michael Goodner |
2007-01-30 |
| 7164206 |
Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer |
Grant Kloster, Jihperng Leu, Lawrence Wong, Patrick Marrow |
2007-01-16 |
| 7138158 |
Forming a dielectric layer using a hydrocarbon-containing precursor |
Robert Meagley, Michael Goodner, Grant Kloster, Michael L. McSwiney, Bob Leet |
2006-11-21 |
| 7135775 |
Enhancement of an interconnect |
Stephen Chambers, Valery M. Dubin, Christine Hau-Riege |
2006-11-14 |
| 6992391 |
Dual-damascene interconnects without an etch stop layer by alternating ILDs |
Lawrence Wong, Patrick Morrow, Jihperng Leu, Grant Kloster |
2006-01-31 |
| 6974772 |
Integrated low-k hard mask |
Sean King |
2005-12-13 |
| 6713873 |
Adhesion between dielectric materials |
Jennifer O'Loughlin, Bruce J. Tufts |
2004-03-30 |
| 6645877 |
Method of operating a processing chamber having multiple stations |
Jennifer O'Loughlin |
2003-11-11 |
| 6518184 |
Enhancement of an interconnect |
Stephen Chambers, Valery M. Dubin, Christine Hau-Riege |
2003-02-11 |
| 6051517 |
Modified zeolite membrane |
Hans H. Funke, Jason W. Klaus, Steven M. George, John L. Falconer, Richard D. Noble |
2000-04-18 |
| 6043177 |
Modification of zeolite or molecular sieve membranes using atomic layer controlled chemical vapor deposition |
John L. Falconer, Steven M. George, Jason W. Klaus, Richard D. Noble, Hans H. Funke |
2000-03-28 |