Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8399317 | Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate, and method therefor | Sean King, Ajay Sharma | 2013-03-19 |
| 8120114 | Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate | Sean King, Ajay Sharma | 2012-02-21 |
| 7790631 | Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal | Ajay Sharma, Sean King, Dennis G. Hanken | 2010-09-07 |
| 7214594 | Method of making semiconductor device using a novel interconnect cladding layer | Lawrence Wong, Jihperng Leu, Grant Kloster, Patrick Morrow | 2007-05-08 |
| 7199473 | Integrated low-k hard mask | Sean King | 2007-04-03 |
| 7169715 | Forming a dielectric layer using porogens | Grant Kloster, Robert Meagley, Michael Goodner | 2007-01-30 |
| 7164206 | Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer | Grant Kloster, Jihperng Leu, Lawrence Wong, Patrick Marrow | 2007-01-16 |
| 7138158 | Forming a dielectric layer using a hydrocarbon-containing precursor | Robert Meagley, Michael Goodner, Grant Kloster, Michael L. McSwiney, Bob Leet | 2006-11-21 |
| 7135775 | Enhancement of an interconnect | Stephen Chambers, Valery M. Dubin, Christine Hau-Riege | 2006-11-14 |
| 6992391 | Dual-damascene interconnects without an etch stop layer by alternating ILDs | Lawrence Wong, Patrick Morrow, Jihperng Leu, Grant Kloster | 2006-01-31 |
| 6974772 | Integrated low-k hard mask | Sean King | 2005-12-13 |
| 6713873 | Adhesion between dielectric materials | Jennifer O'Loughlin, Bruce J. Tufts | 2004-03-30 |
| 6645877 | Method of operating a processing chamber having multiple stations | Jennifer O'Loughlin | 2003-11-11 |
| 6518184 | Enhancement of an interconnect | Stephen Chambers, Valery M. Dubin, Christine Hau-Riege | 2003-02-11 |
| 6051517 | Modified zeolite membrane | Hans H. Funke, Jason W. Klaus, Steven M. George, John L. Falconer, Richard D. Noble | 2000-04-18 |
| 6043177 | Modification of zeolite or molecular sieve membranes using atomic layer controlled chemical vapor deposition | John L. Falconer, Steven M. George, Jason W. Klaus, Richard D. Noble, Hans H. Funke | 2000-03-28 |