Issued Patents All Time
Showing 51–75 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7291545 | Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo +1 more | 2007-11-06 |
| 7292428 | Electrostatic chuck with smart lift-pin mechanism for a plasma reactor | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Biagio Gallo, Amir Al-Bayati | 2007-11-06 |
| 7288491 | Plasma immersion ion implantation process | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo | 2007-10-30 |
| 7244474 | Chemical vapor deposition plasma process using an ion shower grid | Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2007-07-17 |
| 7229340 | Monitoring a metal layer during chemical mechanical polishing | Nils Johansson, Boguslaw A. Swedek, Manoocher Birang | 2007-06-12 |
| 7223676 | Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer | Kartik Ramaswamy, Kenneth S. Collins, Amir Al-Bayati, Biagio Gallo, Andrew Nguyen | 2007-05-29 |
| 7221553 | Substrate support having heat transfer system | Andrew Nguyen, Wing Cheng, Semyon L. Kats, Kartik Ramaswamy, Yan Ye +4 more | 2007-05-22 |
| 7183177 | Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement | Amir Al-Bayati, Kenneth S. Collins, Kartik Ramaswamy, Biagio Gallo, Andrew Nguyen | 2007-02-27 |
| 7166524 | Method for ion implanting insulator material to reduce dielectric constant | Amir Al-Bayati, Rick J. Roberts, Kenneth S. Collins, Ken MacWilliams, Kartik Ramaswamy +2 more | 2007-01-23 |
| 7137354 | Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo +1 more | 2006-11-21 |
| 7126138 | Electron flood apparatus and ion implantation system | Hiroyuki Ito, Yasuhiko Matsunaga | 2006-10-24 |
| 7109098 | Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Biagio Gallo, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2006-09-19 |
| 7094670 | Plasma immersion ion implantation process | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo | 2006-08-22 |
| 7094316 | Externally excited torroidal plasma source | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka, Yan Ye | 2006-08-22 |
| 7037813 | Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo +1 more | 2006-05-02 |
| 7001246 | Method and apparatus for monitoring a metal layer during chemical mechanical polishing | Nils Johansson, Boguslaw A. Swedek, Manoocher Birang | 2006-02-21 |
| 6975107 | Eddy current sensing of metal removal for chemical mechanical polishing | Nils Johansson, Boguslaw A. Swedek, Manoocher Birang | 2005-12-13 |
| 6939434 | Externally excited torroidal plasma source with magnetic control of ion distribution | Kenneth S. Collins, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Michael Barnes +1 more | 2005-09-06 |
| 6930478 | Method for monitoring a metal layer during chemical mechanical polishing using a phase difference signal | Nils Johansson, Boguslaw A. Swedek, Manoocher Birang | 2005-08-16 |
| 6924641 | Method and apparatus for monitoring a metal layer during chemical mechanical polishing | Nils Johansson, Boguslaw A. Swedek, Manoocher Birang | 2005-08-02 |
| 6893907 | Fabrication of silicon-on-insulator structure using plasma immersion ion implantation | Dan Maydan, Randir P. S. Thakur, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy +2 more | 2005-05-17 |
| 6878036 | Apparatus for monitoring a metal layer during chemical mechanical polishing using a phase difference signal | Nils Johansson, Bogusla W Swedek, Manoocher Birang | 2005-04-12 |
| 6679981 | Inductive plasma loop enhancing magnetron sputtering | Shaoher X. Pan, John C. Forster, Fusen Chen | 2004-01-20 |
| 6634313 | High-frequency electrostatically shielded toroidal plasma and radical source | Kenneth S. Collins, John Trow, David Stover, Fernando Silveira | 2003-10-21 |
| 6551446 | Externally excited torroidal plasma source with a gas distribution plate | Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2003-04-22 |