Issued Patents All Time
Showing 76–100 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6494986 | Externally excited multiple torroidal plasma source | Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-12-17 |
| 6475335 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiabing Ma, Peter Loewenhardt, Philip M. Salzman, Allen Zhao | 2002-11-05 |
| 6468388 | Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate | Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-10-22 |
| 6453842 | Externally excited torroidal plasma source using a gas distribution plate | Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-09-24 |
| 6410449 | Method of processing a workpiece using an externally excited torroidal plasma source | Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-06-25 |
| 6348126 | Externally excited torroidal plasma source | Yan Ye, Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-02-19 |
| 6286451 | Dome: shape and temperature controlled surfaces | Tetsuya Ishikawa, Pavel Staryuk | 2001-09-11 |
| 6270617 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiabing Ma, Peter Loewenhardt, Philip M. Salzman, Allen Zhao | 2001-08-07 |
| 6248250 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiaobing Ma, Philip M. Saizman, Peter Loewenhardt, Allen Zhao | 2001-06-19 |
| 6189483 | Process kit | Tetsuya Ishikawa, Padmanabhan Krishnaraj, Kaveh Niazi | 2001-02-20 |
| 6170428 | Symmetric tunable inductively coupled HDP-CVD reactor | Fred C. Redeker, Farhad Moghadam, Tetsuya Ishikawa, Dan Maydan, Shijian Li +5 more | 2001-01-09 |
| 6083344 | Multi-zone RF inductively coupled source configuration | Tetsuya Ishikawa, Manus Wong, Shijian Li, Kaveh Niazi, Kenneth Smyth +3 more | 2000-07-04 |
| 6027601 | Automatic frequency tuning of an RF plasma source of an inductively coupled plasma reactor | — | 2000-02-22 |
| 6028777 | High frequency power supply generator | Binh Nguyen, Masato Toshima, Trung Nguyen | 2000-02-22 |
| 6020686 | Inductively and multi-capacitively coupled plasma reactor | Yan Ye, Diana Xiaobing Ma, Gerald Yin | 2000-02-01 |
| 5900062 | Lift pin for dechucking substrates | Peter Loewenhardt, Raymond Gristi, Gerald Yin, Yan Ye | 1999-05-04 |
| 5897712 | Plasma uniformity control for an inductive plasma source | Peter Loewenhardt, Timothy D. Driscoll, Gerald Yin | 1999-04-27 |
| 5865937 | Broad-band adjustable power ratio phase-inverting plasma reactor | Hongching Shan, Robert Wu, Michael Welch | 1999-02-02 |
| 5849136 | High frequency semiconductor wafer processing apparatus and method | Donald M. Mintz, Sasson Somekh, Dan Maydan, Kenneth S. Collins | 1998-12-15 |
| 5817534 | RF plasma reactor with cleaning electrode for cleaning during processing of semiconductor wafers | Yan Ye, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt, Donald Olgado +2 more | 1998-10-06 |
| 5783101 | High etch rate residue free metal etch process with low frequency high power inductive coupled plasma | Diana Xiaobing Ma, Gerald Yin | 1998-07-21 |
| 5777289 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiaobing Ma, Philip M. Salzman, Peter Loewenhardt, Allen Zhao | 1998-07-07 |
| 5753044 | RF plasma reactor with hybrid conductor and multi-radius dome ceiling | Gerald Yin, Diana Xiabing Ma, Phil Salzman, Peter Loewenhardt, Allen Zhao | 1998-05-19 |
| 5710486 | Inductively and multi-capacitively coupled plasma reactor | Yan Ye, Diana Xiaobing Ma, Gerald Yin | 1998-01-20 |
| 5688357 | Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor | — | 1997-11-18 |