| 6418960 |
Ultrasonic enhancement for solvent purge of a liquid delivery system |
Ted G. Yoshidome |
2002-07-16 |
| 6162297 |
Embossed semiconductor fabrication parts |
Anantha K. Subramani, Lolita Sharp, David Datong Huo |
2000-12-19 |
| 5849136 |
High frequency semiconductor wafer processing apparatus and method |
Hiroji Hanawa, Sasson Somekh, Dan Maydan, Kenneth S. Collins |
1998-12-15 |
| 5762748 |
Lid and door for a vacuum chamber and pretreatment therefor |
Thomas Banholzer, Dan Marohl, Avi Tepman |
1998-06-09 |
| 5618382 |
High-frequency semiconductor wafer processing apparatus and method |
Hiroji Hanawa, Sasson Somekh, Dan Maydan, Kenneth S. Collins |
1997-04-08 |
| 5565058 |
Lid and door for a vacuum chamber and pretreatment therefor |
Thomas Banholzer, Dan Marohl, Avi Tepman |
1996-10-15 |
| 5401319 |
Lid and door for a vacuum chamber and pretreatment therefor |
Thomas Banholzer, Dan Marohl, Avi Tepman |
1995-03-28 |
| 5391275 |
Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
— |
1995-02-21 |
| 5223457 |
High-frequency semiconductor wafer processing method using a negative self-bias |
Hiroji Hanawa, Sasson Someskh, Dan Maydan |
1993-06-29 |
| 5202008 |
Method for preparing a shield to reduce particles in a physical vapor deposition chamber |
Humoyoun Talieh, Haim Gilboa |
1993-04-13 |
| 4865712 |
Apparatus for manufacturing planarized aluminum films |
— |
1989-09-12 |
| 4661228 |
Apparatus and method for manufacturing planarized aluminum films |
— |
1987-04-28 |
| 4657654 |
Targets for magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges |
— |
1987-04-14 |
| 4627904 |
Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias |
— |
1986-12-09 |
| 4595482 |
Apparatus for and the method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges |
— |
1986-06-17 |