Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6418960 | Ultrasonic enhancement for solvent purge of a liquid delivery system | Ted G. Yoshidome | 2002-07-16 |
| 6162297 | Embossed semiconductor fabrication parts | Anantha K. Subramani, Lolita Sharp, David Datong Huo | 2000-12-19 |
| 5849136 | High frequency semiconductor wafer processing apparatus and method | Hiroji Hanawa, Sasson Somekh, Dan Maydan, Kenneth S. Collins | 1998-12-15 |
| 5762748 | Lid and door for a vacuum chamber and pretreatment therefor | Thomas Banholzer, Dan Marohl, Avi Tepman | 1998-06-09 |
| 5618382 | High-frequency semiconductor wafer processing apparatus and method | Hiroji Hanawa, Sasson Somekh, Dan Maydan, Kenneth S. Collins | 1997-04-08 |
| 5565058 | Lid and door for a vacuum chamber and pretreatment therefor | Thomas Banholzer, Dan Marohl, Avi Tepman | 1996-10-15 |
| 5401319 | Lid and door for a vacuum chamber and pretreatment therefor | Thomas Banholzer, Dan Marohl, Avi Tepman | 1995-03-28 |
| 5391275 | Method for preparing a shield to reduce particles in a physical vapor deposition chamber | — | 1995-02-21 |
| 5223457 | High-frequency semiconductor wafer processing method using a negative self-bias | Hiroji Hanawa, Sasson Someskh, Dan Maydan | 1993-06-29 |
| 5202008 | Method for preparing a shield to reduce particles in a physical vapor deposition chamber | Humoyoun Talieh, Haim Gilboa | 1993-04-13 |
| 4865712 | Apparatus for manufacturing planarized aluminum films | — | 1989-09-12 |
| 4661228 | Apparatus and method for manufacturing planarized aluminum films | — | 1987-04-28 |
| 4657654 | Targets for magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges | — | 1987-04-14 |
| 4627904 | Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias | — | 1986-12-09 |
| 4595482 | Apparatus for and the method of controlling magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges | — | 1986-06-17 |