Issued Patents All Time
Showing 26–50 of 110 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7968439 | Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces | Shijian Li, Kartik Ramaswamy, Seon-Mee Cho, Biagio Gallo, Dongwon Choi +1 more | 2011-06-28 |
| 7967996 | Process for wafer backside polymer removal and wafer front side photoresist removal | Kenneth S. Collins, Andrew Nguyen, Shahid Rauf, Ajit Balakrishna, Valentin N. Todorow +6 more | 2011-06-28 |
| 7884025 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Kenneth S. Collins, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-02-08 |
| 7879731 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Kenneth S. Collins, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-02-01 |
| 7768765 | Substrate support having heat transfer system | Andrew Nguyen, Wing Cheng, Semyon L. Kats, Kartik Ramaswamy, Yan Ye +4 more | 2010-08-03 |
| 7767561 | Plasma immersion ion implantation reactor having an ion shower grid | Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2010-08-03 |
| 7700465 | Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo +1 more | 2010-04-20 |
| 7695590 | Chemical vapor deposition plasma reactor having plural ion shower grids | Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2010-04-13 |
| 7666464 | RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor | Kenneth S. Collins, Kartik Ramaswamy, Amir Al-Bayati, Andrew Nguyen, Biagio Gallo | 2010-02-23 |
| 7642180 | Semiconductor on insulator vertical transistor fabrication and doping process | Amir Al-Bayati, Kenneth S. Collins, Kartik Ramaswamy, Biagio Gallo, Andrew Nguyen | 2010-01-05 |
| 7552736 | Process for wafer backside polymer removal with a ring of plasma under the wafer | Kenneth S. Collins, Andrew Nguyen, Ajit Balakrishna, David Palagashvili, James P. Cruse +7 more | 2009-06-30 |
| 7465478 | Plasma immersion ion implantation process | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo | 2008-12-16 |
| 7430984 | Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements | Kartik Ramaswamy, Kenneth S. Collins, Andrew Nguyen, Gonzalo Monroy | 2008-10-07 |
| 7428915 | O-ringless tandem throttle valve for a plasma reactor chamber | Andrew Nguyen, Kenneth S. Collins, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo | 2008-09-30 |
| 7429532 | Semiconductor substrate process using an optically writable carbon-containing mask | Kartik Ramaswamy, Biagio Gallo, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-09-30 |
| 7422775 | Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Biagio Gallo, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-09-09 |
| 7393765 | Low temperature CVD process with selected stress of the CVD layer on CMOS devices | Kartik Ramaswamy, Kenneth S. Collins, Amir Al-Bayati, Biagio Gallo, Andrew Nguyen | 2008-07-01 |
| 7335611 | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer | Kartik Ramaswamy, Biagio Gallo, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-02-26 |
| 7323401 | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask | Kartik Ramaswamy, Biagio Gallo, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2008-01-29 |
| 7320734 | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo +1 more | 2008-01-22 |
| 7312148 | Copper barrier reflow process employing high speed optical annealing | Kartik Ramaswamy, Biagio Gallo, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2007-12-25 |
| 7312162 | Low temperature plasma deposition process for carbon layer deposition | Kartik Ramaswamy, Biagio Gallo, Kenneth S. Collins, Kai Ma, Vijay Parihar +4 more | 2007-12-25 |
| 7303982 | Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage | Kenneth S. Collins, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo +1 more | 2007-12-04 |
| 7294563 | Semiconductor on insulator vertical transistor fabrication and doping process | Amir Al-Bayati, Kenneth S. Collins, Kartik Ramaswamy, Biagio Gallo, Andrew Nguyen | 2007-11-13 |
| 7291360 | Chemical vapor deposition plasma process using plural ion shower grids | Tsutomu Tanaka, Kenneth S. Collins, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2007-11-06 |