| 12237149 |
Reducing aspect ratio dependent etch with direct current bias pulsing |
Deyang Li, Sunil Srinivasan, Yi-Chuan Chou, Shahid Rauf, Kuan-Ting Liu +5 more |
2025-02-25 |
| 12125699 |
Selective carbon deposition on top and bottom surfaces of semiconductor substrates |
Abhijeet S. Bagal, Qian Fu, Kuan-Ting Liu |
2024-10-22 |
| 11562909 |
Directional selective junction clean with field polymer protections |
Yu Lei, Xuesong Lu, Tae Hong Ha, Xianmin Tang, Andrew Nguyen +4 more |
2023-01-24 |
| 9533332 |
Methods for in-situ chamber clean utilized in an etching processing chamber |
Noel Sun, Meihua Shen, Nicolas Gani, Radhika Mani |
2017-01-03 |
| 8293656 |
Selective self-aligned double patterning of regions in an integrated circuit device |
Hun Sang Kim, Hyungje Woo, Shinichi Koseki, Eda Tuncel |
2012-10-23 |
