Issued Patents All Time
Showing 51–75 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10774423 | Tunable ground planes in plasma chambers | Karthik Janakiraman, Thomas Nowak, Juan Carlos Rocha-Alvarez, Mark Fodor, Dale R. Du Bois +4 more | 2020-09-15 |
| 10720349 | Temperature measurement in multi-zone heater | Dale R. Du Bois, Bozhi Yang, Jianhua Zhou, Sanjeev Baluja, Juan Carlos Rocha-Alvarez | 2020-07-21 |
| 10669629 | Showerhead assembly with multiple fluid delivery zones | Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Sam Kim, Tuan Nguyen | 2020-06-02 |
| 10636628 | Method for cleaning a process chamber | Kalyanjit Ghosh, Shailendra Srivastava, Tejas Ulavi, Yusheng Zhou, Sanjeev Baluja | 2020-04-28 |
| 10600624 | System and method for substrate processing chambers | Kalyanjit Ghosh, Sanjeev Baluja, Mayur Govind Kulkarni, Shailendra Srivastava, Tejas Ulavi +9 more | 2020-03-24 |
| 10570517 | Apparatus and method for UV treatment, chemical treatment, and deposition | Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Scott A. Hendrickson, Thomas Nowak | 2020-02-25 |
| 10544508 | Controlling temperature in substrate processing systems | Juan Carlos Rocha-Alvarez, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan | 2020-01-28 |
| 10438860 | Dynamic wafer leveling/tilting/swiveling steps for use during a chemical vapor deposition process | Juan Carlos Rocha, Karthik Janakiraman, Tuan Nguyen | 2019-10-08 |
| 10431480 | External substrate rotation in a semiconductor processing system | Tuan Nguyen, Juan Carlos Rocha-Alvarez | 2019-10-01 |
| 10385448 | Apparatus and method for purging gaseous compounds | Juan Carlos Rocha-Alvarez, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan | 2019-08-20 |
| 10388121 | Method for providing notifications | Ayushi GUPTA, Prantik Banerjee, Theophilus Thomas, Kyoungwoon Hahm, Arun Prabhakar +18 more | 2019-08-20 |
| 10347465 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Mohamad A. Ayoub, Jian J. Chen | 2019-07-09 |
| 10276353 | Dual-channel showerhead for formation of film stacks | Kaushik Alayavalli, Xinhai Han, Praket P. Jha, Masaki Ogata, Zhijun Jiang +6 more | 2019-04-30 |
| 10266943 | Plasma corrosion resistive heater for high temperature processing | Abdul Aziz Khaja, Ren-Guan Duan, Jianhua Zhou, Juan Carlos Rocha-Alvarez | 2019-04-23 |
| 10233543 | Showerhead assembly with multiple fluid delivery zones | Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Sam Kim, Tuan Nguyen | 2019-03-19 |
| 10227695 | Shadow ring for modifying wafer edge and bevel deposition | Dale R. Du Bois, Mohamad A. Ayoub, Robert W. Kim, Mark Fodor, Binh Nguyen +6 more | 2019-03-12 |
| 10161035 | Apparatus and method for purging gaseous compounds | Juan Carlos Rocha-Alvarez, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan | 2018-12-25 |
| 10153185 | Substrate temperature measurement in multi-zone heater | Dale R. Du Bois, Bozhi Yang, Jianhua Zhou, Sanjeev Baluja, Juan Carlos Rocha-Alvarez | 2018-12-11 |
| 10128118 | Bottom and side plasma tuning having closed loop control | Juan Carlos Rocha-Alvarez, Ganesh Balasubramanian, Jianhua Zhou, Ramprakash Sankarakrishnan, Mohamad A. Ayoub +1 more | 2018-11-13 |
| 10128088 | Graded in-situ charge trapping layers to enable electrostatic chucking and excellent particle performance for boron-doped carbon films | Prashant Kumar Kulshreshtha, Ziqing Duan, Abdul Aziz Khaja, Zheng John Ye | 2018-11-13 |
| 10060032 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-08-28 |
| 10030306 | PECVD apparatus and process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2018-07-24 |
| 9922819 | Wafer rotation in a semiconductor chamber | Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan, Robert W. Kim, Dale R. Du Bois +2 more | 2018-03-20 |
| 9865431 | Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber | Mohamad A. Ayoub, Jian J. Chen | 2018-01-09 |
| 9816187 | PECVD process | Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more | 2017-11-14 |