Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8591699 | Method and system for supplying a cleaning gas into a process chamber | Ramprakash Sankarakrishnan, Ganesh Balasubramanian, Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Thomas Nowak +2 more | 2013-11-26 |
| 8274017 | Multifunctional heater/chiller pedestal for wide range wafer temperature control | Lipyeow Yap, Tuan Nguyen, Sanjeev Baluja, Thomas Nowak, Juan Carlos Rocha-Alvarez +1 more | 2012-09-25 |
| 8203126 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho +2 more | 2012-06-19 |
| 7922440 | Apparatus and method for centering a substrate in a process chamber | Ganesh Balasubramanian, Mark Fodor, Chiu Chan, Karthik Janakiraman | 2011-04-12 |
| 7777198 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho +2 more | 2010-08-17 |
| 7566891 | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors | Juan Carlos Rocha-Alvarez, Thomas Nowak, Sanjeev Baluja, Scott A. Hendrickson, Dustin W. Ho +2 more | 2009-07-28 |
| 6685779 | Method and a system for sealing an epitaxial silicon layer on a substrate | David K. Carlson, Paul B. Comita, Norma Riley | 2004-02-03 |
| 6489220 | Method and a system for sealing an epitaxial silicon layer on a substrate | David K. Carlson | 2002-12-03 |
| 6436194 | Method and a system for sealing an epitaxial silicon layer on a substrate | David K. Carlson | 2002-08-20 |
| 6376387 | Method of sealing an epitaxial silicon layer on a substrate | David K. Carlson, Paul B. Comita, Norma Riley | 2002-04-23 |
| 6170433 | Method and apparatus for processing a wafer | — | 2001-01-09 |
| 5326725 | Clamping ring and susceptor therefor | Semyon Sherstinsky, Charles C. Harris, Mei Chang, James Roberts, Susan Telford +3 more | 1994-07-05 |
| 5320680 | Primary flow CVD apparatus comprising gas preheater and means for substantially eddy-free gas flow | Arthur J. Learn, Nicholas Miller, Richard A. Seilheimer | 1994-06-14 |