Issued Patents All Time
Showing 51–75 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9947549 | Cobalt-containing material removal | Xikun Wang, Zhenjiang Cui, Nitin K. Ingle | 2018-04-17 |
| 9922840 | Adjustable remote dissociation | Kenneth D. Schatz, Soonwook Jung, Dmitry Lubomirsky | 2018-03-20 |
| 9892888 | Particle generation suppresor by DC bias modulation | Jonghoon Baek, Xinglong Chen, Dmitry Lubomirsky | 2018-02-13 |
| 9874524 | In-situ spatially resolved plasma monitoring by using optical emission spectroscopy | Tae Seung Cho, Junghoon Kim, Soonwook Jung, Dmitry Lubomirsky | 2018-01-23 |
| 9846130 | Ceramic ring test device | Satoru Kobayashi, Yufei Zhu, Saurabh Garg, Dmitry Lubomirsky | 2017-12-19 |
| 9837249 | Radial waveguide systems and methods for post-match control of microwaves | Satoru Kobayashi, Dmitry Lubomirsky, Hideo Sugai | 2017-12-05 |
| 9773648 | Dual discharge modes operation for remote plasma | Tae Seung Cho, Yi-Heng Sen, Dmitry Lubomirsky | 2017-09-26 |
| 9728437 | High temperature chuck for plasma processing systems | Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more | 2017-08-08 |
| 9711366 | Selective etch for metal-containing materials | Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Xikun Wang, Jeffrey W. Anthis | 2017-07-18 |
| 9659753 | Grooved insulator to reduce leakage current | Tae Seung Cho, Sang Won Kang, Dongqing Yang, Raymond W. Lu, Peter M. Hillman +3 more | 2017-05-23 |
| 9593421 | Particle generation suppressor by DC bias modulation | Jonghoon Baek, Xinglong Chen, Dmitry Lubomirsky | 2017-03-14 |
| 9564296 | Radial waveguide systems and methods for post-match control of microwaves | Satoru Kobayashi, Dmitry Lubomirsky, Hideo Sugai | 2017-02-07 |
| 9472417 | Plasma-free metal etch | Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Xikun Wang, Jeffrey W. Anthis | 2016-10-18 |
| 9460898 | Plasma generation chamber with smooth plasma resistant coating | Sung Je Kim, Dmitry Lubomirsky | 2016-10-04 |
| 9384997 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Saurabh Garg +2 more | 2016-07-05 |
| 9373517 | Semiconductor processing with DC assisted RF power for improved control | Jang-Gyoo Yang, Xinglong Chen, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman | 2016-06-21 |
| 9355922 | Systems and methods for internal surface conditioning in plasma processing equipment | Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang | 2016-05-31 |
| 9299537 | Radial waveguide systems and methods for post-match control of microwaves | Satoru Kobayashi, Dmitry Lubomirsky, Hideo Sugai | 2016-03-29 |
| 9299582 | Selective etch for metal-containing materials | Nitin K. Ingle, Jessica S. Kachian, Lin Xu, Xikun Wang, Jeffrey W. Anthis | 2016-03-29 |
| 9299538 | Radial waveguide systems and methods for post-match control of microwaves | Satoru Kobayashi, Dmitry Lubomirsky | 2016-03-29 |
| 9132436 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more | 2015-09-15 |
| 9117855 | Polarity control for remote plasma | Tae Seung Cho, Yi-Heng Sen, Dmitry Lubomirsky | 2015-08-25 |
| 8969212 | Dry-etch selectivity | He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Saurabh Garg +2 more | 2015-03-03 |
| 8894767 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2014-11-25 |
| 7989365 | Remote plasma source seasoning | Soo Hyun Jeon, Toan Q. Tran, Jang-Gyoo Yang, Qiwei Liang, Dmitry Lubomirsky | 2011-08-02 |