Issued Patents All Time
Showing 26–50 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10920319 | Ceramic showerheads with conductive electrodes | Laksheswar Kalita, Dmitry Lubomirsky, Tien Fak Tan, LokKee Loh, Saravjeet Singh +1 more | 2021-02-16 |
| 10903052 | Systems and methods for radial and azimuthal control of plasma uniformity | Satoru Kobayashi, Hideo Sugai, Nikolai Kalnin, Toan Q. Tran, Dmitry Lubomirsky | 2021-01-26 |
| 10796922 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang | 2020-10-06 |
| 10707061 | Systems and methods for internal surface conditioning in plasma processing equipment | Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang | 2020-07-07 |
| 10593560 | Magnetic induction plasma source for semiconductor processes and equipment | Tae Seung Cho, Soonwook Jung, Junghoon Kim, Satoru Kobayashi, Kenneth D. Schatz +1 more | 2020-03-17 |
| 10593523 | Systems and methods for internal surface conditioning in plasma processing equipment | Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang | 2020-03-17 |
| 10550472 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2020-02-04 |
| 10551328 | Ceramic ring test device | Satoru Kobayashi, Yufei Zhu, Saurabh Garg, Dmitry Lubomirsky | 2020-02-04 |
| 10541184 | Optical emission spectroscopic techniques for monitoring etching | Soonwook Jung, Dmitry Lubomirsky | 2020-01-21 |
| 10522371 | Systems and methods for improved semiconductor etching and component protection | Tien Fak Tan, Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy | 2019-12-31 |
| 10504754 | Systems and methods for improved semiconductor etching and component protection | Tien Fak Tan, Lok Kee Loh, Dmitry Lubomirsky, Soonwook Jung, Martin Yue Choy | 2019-12-10 |
| 10504700 | Plasma etching systems and methods with secondary plasma injection | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky | 2019-12-10 |
| 10504697 | Particle generation suppresor by DC bias modulation | Jonghoon Baek, Xinglong Chen, Dmitry Lubomirsky | 2019-12-10 |
| 10490418 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang | 2019-11-26 |
| 10468285 | High temperature chuck for plasma processing systems | Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more | 2019-11-05 |
| 10460915 | Rotatable substrate support having radio frequency applicator | Satoru Kobayashi, Kirby H. Floyd, Hiroji Hanawa, Dmitry Lubomirsky | 2019-10-29 |
| 10453655 | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion | Satoru Kobayashi, Hideo Sugai, Kartik Ramaswamy, Dmitry Lubomirsky | 2019-10-22 |
| 10431429 | Systems and methods for radial and azimuthal control of plasma uniformity | Satoru Kobayashi, Hideo Sugai, Nikolai Kalnin, Toan Q. Tran, Dmitry Lubomirsky | 2019-10-01 |
| 10354843 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more | 2019-07-16 |
| 10340124 | Generalized cylindrical cavity system for microwave rotation and impedance shifting by irises in a power-supplying waveguide | Satoru Kobayashi, Hideo Sugai, Toan Q. Tran, Dmitry Lubomirsky | 2019-07-02 |
| 10319649 | Optical emission spectroscopy (OES) for remote plasma monitoring | Tae Seung Cho, Junghoon Kim, Dmitry Lubomirsky, Shankar Venkataraman | 2019-06-11 |
| 10153133 | Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion | Satoru Kobayashi, Hideo Sugai, Kartik Ramaswamy, Dmitry Lubomirsky | 2018-12-11 |
| 10032606 | Semiconductor processing with DC assisted RF power for improved control | Jang-Gyoo Yang, Xinglong Chen, Jonghoon Baek, Saurabh Garg, Shankar Venkataraman | 2018-07-24 |
| 9978564 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more | 2018-05-22 |
| 9966240 | Systems and methods for internal surface conditioning assessment in plasma processing equipment | Yufei Zhu, Edwin C. Suarez, Nitin K. Ingle, Dmitry Lubomirsky, Jiayin Huang | 2018-05-08 |