Issued Patents All Time
Showing 26–50 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8512510 | Plasma processing method and apparatus | Jun Hirose, Masahiro Ogasawara, Taichi Hirano, Hiromitsu Sasaki, Tetsuo Yoshida +4 more | 2013-08-20 |
| 8506753 | Capacitive coupling plasma processing apparatus and method for using the same | Naoki Matsumoto, Chishio Koshimizu | 2013-08-13 |
| 8137471 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +6 more | 2012-03-20 |
| 8084375 | Hot edge ring with sloped upper surface | Sathya Mani, Gautam Bhattacharyya, Gregory R. Bettencourt, Sandy Chao | 2011-12-27 |
| 8080126 | Plasma processing apparatus | Keizo Hirose | 2011-12-20 |
| 8048327 | Plasma processing apparatus and control method thereof | Masatoshi Kitano | 2011-11-01 |
| 8008596 | Plasma processing apparatus and electrode used therein | Takashi Suzuki | 2011-08-30 |
| 7993489 | Capacitive coupling plasma processing apparatus and method for using the same | Naoki Matsumoto, Chishio Koshimizu | 2011-08-09 |
| 7988816 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +11 more | 2011-08-02 |
| 7988814 | Plasma processing apparatus, plasma processing method, focus ring, and focus ring component | — | 2011-08-02 |
| 7951262 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +10 more | 2011-05-31 |
| 7882800 | Ring mechanism, and plasma processing device using the ring mechanism | Mitsuru Hashimoto, Hideaki Tanaka, Shigeru Tahara, Kunihiko Hinata, Jun Ooyabu | 2011-02-08 |
| 7740737 | Plasma processing apparatus and method | Masaru Sugimoto, Kunihiko Hinata, Noriyuki Kobayashi, Chishio Koshimizu, Ryuji Ohtani +6 more | 2010-06-22 |
| 7658816 | Focus ring and plasma processing apparatus | Hideaki Tanaka, Nobuyuki Okayama, Masaaki Miyagawa, Shunsuke Mizukami, Wataru Shimizu +5 more | 2010-02-09 |
| 7642193 | Method of treating a mask layer prior to performing an etching process | Peter L. G. Ventzek, Lee Chen, Ikuo Sawada | 2010-01-05 |
| 7572386 | Method of treating a mask layer prior to performing an etching process | Peter L. G. Ventzek, Lee Chen, Ikuo Sawada | 2009-08-11 |
| 7537672 | Apparatus for plasma processing | Keizo Hirose | 2009-05-26 |
| 7506610 | Plasma processing apparatus and method | Jun Hirose, Masahiro Ogasawara, Taichi Hirano, Hiromitsu Sasaki, Tetsuo Yoshida +4 more | 2009-03-24 |
| 7494561 | Plasma processing apparatus and method, and electrode plate for plasma processing apparatus | Jun Hirose, Masahiro Ogasawara, Taichi Hirano, Hiromitsu Sasaki, Tetsuo Yoshida +4 more | 2009-02-24 |
| 7449414 | Method of treating a mask layer prior to performing an etching process | Peter L. G. Ventzek, Lee Chen, Ikuo Sawada | 2008-11-11 |
| 6764575 | Magnetron plasma processing apparatus | Tomomi Yamasaki, Hidetoshi Kimura, Junichi Arami, Hiroo Ono, Koji Miyata | 2004-07-20 |
| 6733624 | Apparatus for holding an object to be processed | Shinji Himori | 2004-05-11 |
| 6576860 | Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate | Chishio Koshimizu, Jun Ooyabu, Hideki Takeuchi | 2003-06-10 |
| 6544380 | Plasma treatment method and apparatus | Masayuki Tomoyasu, Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara, Yukio Naito +6 more | 2003-04-08 |
| 6426477 | Plasma processing method and apparatus for eliminating damages in a plasma process of a substrate | Chishio Koshimizu, Jun Ooyabu, Hideki Takeuchi | 2002-07-30 |