Issued Patents All Time
Showing 51–66 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6423242 | Etching method | Masayuki Kojima, Yoshifumi Tahara, Masayuki Tomoyasu | 2002-07-23 |
| 6264788 | Plasma treatment method and apparatus | Masayuki Tomoyasu, Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara, Yukio Naito +6 more | 2001-07-24 |
| 6190495 | Magnetron plasma processing apparatus | Kazuhiro Kubota, Shigeki Tozawa, Jun Hirose, Tomomi Kondo | 2001-02-20 |
| 6106737 | Plasma treatment method utilizing an amplitude-modulated high frequency power | Masayuki Tomoyasu, Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara, Yukio Naito +6 more | 2000-08-22 |
| 6074518 | Plasma processing apparatus | Kosuke Imafuku, Shosuke Endo, Kazuhiro Tahara, Hiroshi Tsuchiya, Masayuki Tomoyasu +6 more | 2000-06-13 |
| 6072147 | Plasma processing system | Jun Ooyabu | 2000-06-06 |
| 5972799 | Dry etching method | Ryuji HONDA | 1999-10-26 |
| 5928963 | Plasma etching method | — | 1999-07-27 |
| 5919332 | Plasma processing apparatus | Masahiro Ogasawara, Keizo Hirose, Kazuya Nagaseki, Riki Tomoyoshi, Makoto Aoki | 1999-07-06 |
| 5900103 | Plasma treatment method and apparatus | Masayuki Tomoyasu | 1999-05-04 |
| 5698035 | Heat-resistant electrode material, electrode using the same, and apparatus having plasma generating unit using this electrode | Masahiko Matsudo, Kei Isozaki, Yutaka Hirashima | 1997-12-16 |
| 5252892 | Plasma processing apparatus | Kohei Kawamura, Masahiko Matsudo, Naoki Takayama | 1993-10-12 |
| 5101110 | Ion generator | Masahiko Matsudo, Naoki Takayama, Kohei Kawamura | 1992-03-31 |
| 5089747 | Electron beam excitation ion source | Kohei Kawamura, Naoki Takayama | 1992-02-18 |
| 5083061 | Electron beam excited ion source | Kohei Kawamura | 1992-01-21 |
| 5028791 | Electron beam excitation ion source | Kohei Kawamura, Masahiko Matsudo, Naoki Takayama | 1991-07-02 |