Issued Patents All Time
Showing 51–75 of 92 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9443700 | Electron beam plasma source with segmented suppression electrode for uniform plasma generation | Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Nipun Misra, Kartik Ramaswamy +1 more | 2016-09-13 |
| 9196462 | Showerhead insulator and etch chamber liner | Olga Regelman | 2015-11-24 |
| 9129777 | Electron beam plasma source with arrayed plasma sources for uniform plasma generation | Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Nipun Misra, Gary Leray +1 more | 2015-09-08 |
| 9082590 | Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates | Kenneth S. Collins, Richard Fovell, Jason A. Kenney, Kartik Ramaswamy, Shahid Rauf | 2015-07-14 |
| 8951384 | Electron beam plasma source with segmented beam dump for uniform plasma generation | Leonid Dorf, Shahid Rauf, Kenneth S. Collins, Nipun Misra, Gary Leray +1 more | 2015-02-10 |
| 8920597 | Symmetric VHF source for a plasma reactor | Kartik Ramaswamy, Igor Markovsky, Zhigang Chen, Kenneth S. Collins, Shahid Rauf +3 more | 2014-12-30 |
| 8876024 | Heated showerhead assembly | Olga Regelman, Kallol Bera, Douglas A. Buchberger, Jr., Paul Brillhart | 2014-11-04 |
| 8652297 | Symmetric VHF plasma power coupler with active uniformity steering | Kenneth S. Collins, Zhigang Chen, Kartik Ramaswamy, Shahid Rauf, Andrew Nguyen | 2014-02-18 |
| 8486194 | Apparatus for efficient removal of halogen residues from etched substrates | Kenneth J. Bhang, Matthew F. Davis, Travis Morey | 2013-07-16 |
| 8440019 | Lower liner with integrated flow equalizer and improved conductance | Andrew Nguyen, Ajit Balakrishna, Michael Kutney | 2013-05-14 |
| 8313578 | Etching chamber having flow equalizer and lower liner | Kin Pong Lo, Kallol Bera, Michael Kutney, Matthew L. Miller | 2012-11-20 |
| 8293016 | Apparatus for efficient removal of halogen residues from etched substrates | Kenneth J. Bahng, Matthew F. Davis, Travis Morey | 2012-10-23 |
| 8282736 | Lower liner with integrated flow equalizer and improved conductance | Andrew Nguyen, Ajit Balakrishna, Michael Kutney | 2012-10-09 |
| 8123902 | Gas flow diffuser | Paul Brillhart, Daniel J. Hoffman, Xiaoping Zhou, Matthew L. Miller | 2012-02-28 |
| 8118938 | Lower liner with integrated flow equalizer and improved conductance | Andrew Nguyen, Ajit Balakrishna, Michael Kutney | 2012-02-21 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-20 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-12-13 |
| 7987814 | Lower liner with integrated flow equalizer and improved conductance | Andrew Nguyen, Ajit Balakrishna, Michael Kutney | 2011-08-02 |
| 7972467 | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor | Kallol Bera, Yan Ye, Daniel J. Hoffman, Steven C. Shannon, Douglas A. Buchberger, Jr. | 2011-07-05 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-06-28 |
| 7884025 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-08 |
| 7879731 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf +10 more | 2011-02-01 |
| 7780866 | Method of plasma confinement for enhancing magnetic control of plasma radial distribution | Matthew L. Miller, Daniel J. Hoffman, Steven C. Shannon, Michael Kutney, Andrew Nguyen | 2010-08-24 |
| 7754997 | Apparatus and method to confine plasma and reduce flow resistance in a plasma | Kallol Bera, Yan Ye, Daniel J. Hoffman, Steven C. Shannon, Douglas A. Buchberger, Jr. | 2010-07-13 |
| 7585384 | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor | Kallol Bera, Yan Ye, Daniel J. Hoffman, Steven C. Shannon, Douglas A. Buchberger, Jr. | 2009-09-08 |