Issued Patents All Time
Showing 76–92 of 92 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7196283 | Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface | Douglas A. Buchberger, Jr., Daniel J. Hoffman, Olga Regelman, Keiji Horioka, Jang-Gyoo Yang | 2007-03-27 |
| 7147719 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, Evans Lee, Siamak Salimian | 2006-12-12 |
| 6983892 | Gas distribution showerhead for semiconductor processing | Hamid Noorbakhsh, Jennifer Y. Sun, Larry D. Elizaga | 2006-01-10 |
| 6900596 | Capacitively coupled plasma reactor with uniform radial distribution of plasma | Jang-Gyoo Yang, Daniel J. Hoffman, Douglas A. Buchberger, Jr., Matthew L. Miller, Kang-Lie Chiang +2 more | 2005-05-31 |
| 6899111 | Configurable single substrate wet-dry integrated cluster cleaner | Paul Luscher, Siamak Salimian, Michael Welch | 2005-05-31 |
| 6863835 | Magnetic barrier for plasma in chamber exhaust | Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian, Paul Luscher +1 more | 2005-03-08 |
| 6797639 | Dielectric etch chamber with expanded process window | Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan, Claes Bjorkman +3 more | 2004-09-28 |
| 6773544 | Magnetic barrier for plasma in chamber exhaust | Hamid Noorbakhsh, Evans Lee, Hongqing Shan, Siamak Salimian, Paul Luscher +1 more | 2004-08-10 |
| 6716302 | Dielectric etch chamber with expanded process window | Hamid Noorbakhsh, Evans Lee, Bryan Pu, Hongching Shan, Claes Bjorkman +3 more | 2004-04-06 |
| 6647918 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, Evans Lee, Siamak Salimian | 2003-11-18 |
| 6589361 | Configurable single substrate wet-dry integrated cluster cleaner | Paul Luscher, Siamak Salimian | 2003-07-08 |
| 6562189 | Plasma reactor with a tri-magnet plasma confinement apparatus | Efrain Quiles, Hamid Noorbakhsh | 2003-05-13 |
| 6513452 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Robert Wu, Bryan Pu +2 more | 2003-02-04 |
| 6221782 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Robert Wu, Bryan Pu +2 more | 2001-04-24 |
| 6192827 | Double slit-valve doors for plasma processing | Michael Welch, Homgqing Shan, Paul Luscher, Evans Lee, Siamak Salimian | 2001-02-27 |
| 6076482 | Thin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusion | Ji Ding, Hongching Shan, Siamak Salimian, Evans Lee, Paul Luscher +1 more | 2000-06-20 |
| 5891350 | Adjusting DC bias voltage in plasma chambers | Hong Ching Shan, Evans Lee, Michael Welch, Robert Wu, Bryan Pu +2 more | 1999-04-06 |