Issued Patents All Time
Showing 26–50 of 77 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10386126 | Apparatus for controlling temperature uniformity of a substrate | Xiaoping Zhou, Douglas A. Buchberger, Jr., Andrew Nguyen, Hamid Tavassoli, Surajit Kumar +1 more | 2019-08-20 |
| 10273578 | Top lamp module for carousel deposition chamber | Joseph Yudovsky, Robert T. Trujillo, Kevin Griffin, Garry K. Kwong, Li-Qun Xia +1 more | 2019-04-30 |
| 10121655 | Lateral plasma/radical source | Anantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, John C. Forster, Nattaworn Nuntaworanuch +2 more | 2018-11-06 |
| 10012248 | Annular baffle | Daniel J. Hoffman | 2018-07-03 |
| 9711330 | RF multi-feed structure to improve plasma uniformity | — | 2017-07-18 |
| 9696097 | Multi-substrate thermal management apparatus | Kim Vellore, Andrew J. Constant, Jacob Newman, Jeffrey Blahnik, Jason M. Schaller +3 more | 2017-07-04 |
| 9653267 | Temperature controlled chamber liner | James D. Carducci, Nipun Misra, Larry D. Elizaga | 2017-05-16 |
| 9570275 | Heated showerhead assembly | James D. Carducci, Olga Regelman, Douglas A. Buchberger, Jr., Paul Brillhart | 2017-02-14 |
| 9336997 | RF multi-feed structure to improve plasma uniformity | — | 2016-05-10 |
| 9267742 | Apparatus for controlling the temperature uniformity of a substrate | Xiaoping Zhou, Douglas A. Buchberger, Jr., Andrew Nguyen, Hamid Tavassoli, Surajit Kumar +1 more | 2016-02-23 |
| 9248509 | Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity | Hamid Tavassoli, Surajit Kumar, Xiaoping Zhou, Shane C. Nevil, Douglas A. Buchberger, Jr. | 2016-02-02 |
| 9068265 | Gas distribution plate with discrete protective elements | Dmitry Lubomirsky, Kartik Ramaswamy, Jennifer Y. Sun | 2015-06-30 |
| 8980044 | Plasma reactor with a multiple zone thermal control feed forward control apparatus | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas A. Buchberger, Jr., Douglas H. Burns +5 more | 2015-03-17 |
| 8894805 | Electron beam plasma source with profiled magnet shield for uniform plasma generation | Shahid Rauf, Leonid Dorf, Kenneth S. Collins, Ajit Balakrishna, Gary Leray | 2014-11-25 |
| 8876024 | Heated showerhead assembly | James D. Carducci, Olga Regelman, Douglas A. Buchberger, Jr., Paul Brillhart | 2014-11-04 |
| 8822876 | Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity | Hamid Tavassoli, Surajit Kumar, Xiaoping Zhou, Shane C. Nevil, Douglas A. Buchberger, Jr. | 2014-09-02 |
| 8801893 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor | Paul Brillhart, Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Daniel J. Hoffman +4 more | 2014-08-12 |
| 8647438 | Annular baffle | Daniel J. Hoffman | 2014-02-11 |
| 8608900 | Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns +1 more | 2013-12-17 |
| 8608852 | Temperature controlled plasma processing chamber component with zone dependent thermal efficiencies | Chetan Mahadeswaraswamy, Larry D. Elizaga | 2013-12-17 |
| 8546267 | Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control | Paul Brillhart, Richard Fovell, Douglas A. Buchberger, Jr., Douglas H. Burns, Daniel J. Hoffman +4 more | 2013-10-01 |
| 8512509 | Plasma reactor gas distribution plate with radially distributed path splitting manifold | Shahid Rauf | 2013-08-20 |
| 8337660 | Capacitively coupled plasma reactor having very agile wafer temperature control | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns +5 more | 2012-12-25 |
| 8329586 | Method of processing a workpiece in a plasma reactor using feed forward thermal control | Douglas A. Buchberger, Jr., Paul Brillhart, Richard Fovell, Douglas H. Burns, Daniel J. Hoffman +4 more | 2012-12-11 |
| 8313578 | Etching chamber having flow equalizer and lower liner | James D. Carducci, Kin Pong Lo, Michael Kutney, Matthew L. Miller | 2012-11-20 |