Issued Patents All Time
Showing 51–75 of 223 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10465294 | Oxide and metal removal | Xikun Wang, Jie Liu, Anchuan Wang, Jeffrey W. Anthis, Benjamin Schmiege | 2019-11-05 |
| 10468259 | Charge-trap layer separation and word-line isolation in a 3-D NAND structure | Vinod R. Purayath | 2019-11-05 |
| 10468267 | Water-free etching methods | Zhijun Chen, Lin Xu, Anchuan Wang | 2019-11-05 |
| 10424507 | Fully self-aligned via | Ying Zhang, Abhijit Basu Mallick, Regina Freed, Uday Mitra, Ho-yung David Hwang | 2019-09-24 |
| 10424485 | Enhanced etching processes using remote plasma sources | Dmitry Lubomirsky, Xinglong Chen, Shankar Venkataraman | 2019-09-24 |
| 10410921 | Fully self-aligned via | Ying Zhang, Abhijit Basu Mallick, Regina Freed, Uday Mitra, Ho-yung David Hwang | 2019-09-10 |
| 10403507 | Shaped etch profile with oxidation | Tom Choi, Jungmin Ko | 2019-09-03 |
| 10354889 | Non-halogen etching of silicon-containing materials | Tom Choi, Mandar B. Pandit, Mang-Mang Ling | 2019-07-16 |
| 10319603 | Selective SiN lateral recess | Zhijun Chen, Jiayin Huang, Anchuan Wang | 2019-06-11 |
| 10319600 | Thermal silicon etch | Zihui Li, Rui Cheng, Anchuan Wang, Abhijit Basu Mallick | 2019-06-11 |
| 10297458 | Process window widening using coated parts in plasma etch processes | Dongqing Yang, Tien Fak Tan, Peter M. Hillman, Lala Zhu, Dmitry Lubomirsky +2 more | 2019-05-21 |
| 10256112 | Selective tungsten removal | Xikun Wang | 2019-04-09 |
| 10249507 | Methods for selective etching of a silicon material | Zihui Li, Xing-Fu Zhong, Anchuan Wang | 2019-04-02 |
| 10233547 | Methods of etching films with reduced surface roughness | Benjamin Schmiege, Srinivas D. Nemani, Jeffrey W. Anthis, Xikun Wang, Jie Liu +1 more | 2019-03-19 |
| 10204796 | Methods for selective etching of a silicon material using HF gas without nitrogen etchants | Anchuan Wang, Zihui Li, Mikhail Korolik | 2019-02-12 |
| 10170336 | Methods for anisotropic control of selective silicon removal | Zihui Li, Chia-Ling Kao, Anchuan Wang | 2019-01-01 |
| 10163696 | Selective cobalt removal for bottom up gapfill | Xikun Wang, Jianxin Lei, Roey Shaviv | 2018-12-25 |
| 10128086 | Silicon pretreatment for nitride removal | Jiayin Huang, Zhijun Chen, Anchuan Wang | 2018-11-13 |
| 10113236 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Jang-Gyoo Yang, Qiwei Liang | 2018-10-30 |
| 10062579 | Selective SiN lateral recess | Zhijun Chen, Jiayin Huang, Anchuan Wang | 2018-08-28 |
| 10062578 | Methods for etch of metal and metal-oxide films | Jingchun Zhang, Anchuan Wang | 2018-08-28 |
| 10049891 | Selective in situ cobalt residue removal | Xikun Wang | 2018-08-14 |
| 10043684 | Self-limiting atomic thermal etching systems and methods | Ranga Rao Arnepalli, Prerna Goradia, Robert Jan Visser, Mikhail Korolik, Jayeeta Biswas +1 more | 2018-08-07 |
| 10043674 | Germanium etching systems and methods | Mikhail Korolik, Dimitri Kioussis | 2018-08-07 |
| 10026621 | SiN spacer profile patterning | Jungmin Ko, Tom Choi, Kwang Soo Kim, Theodore Wou | 2018-07-17 |