Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9850568 | Plasma erosion resistant rare-earth oxide based thin film coatings | Jennifer Y. Sun, Biraja P. Kanungo, Vahid Firouzdor | 2017-12-26 |
| 9797037 | Ion beam sputtering with ion assisted deposition for coatings on chamber components | Jennifer Y. Sun, Vahid Firouzdor, Biraja P. Kanungo, Vedapuram S. Achutharaman, Ying Zhang | 2017-10-24 |
| 9761416 | Apparatus and methods for reducing particles in semiconductor process chambers | Andrew Nguyen, Bradley J. Howard, Shahid Rauf, Ajit Balakrishna, Kenneth S. Collins +3 more | 2017-09-12 |
| 9725799 | Ion beam sputtering with ion assisted deposition for coatings on chamber components | Jennifer Y. Sun, Vahid Firouzdor, Biraja P. Kanungo, Vedapuram S. Achutharaman, Ying Zhang | 2017-08-08 |
| 9714465 | Gas distribution blocker apparatus | Lun Tsuei, Alan Tso, Brian Sy-Yuan Shieh | 2017-07-25 |
| 9708713 | Aerosol deposition coating for semiconductor chamber components | Jennifer Y. Sun, Biraja P. Kanungo, Ying Zhang | 2017-07-18 |
| 9089007 | Method and apparatus for substrate support with multi-zone heating | Yao-Hung YANG, Jeonghoon Oh, Frank Hooshdaran, Tao Hou | 2015-07-21 |
| 8911151 | Substrate support bushing | Tao Hou, Jeonghoon Oh, Andrzej Matlosz, Frank Hooshdaran, Yao-Hung YANG | 2014-12-16 |
| 8203126 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more | 2012-06-19 |
| 7829145 | Methods of uniformity control for low flow process and chamber to chamber matching | Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Daemian Raj | 2010-11-09 |
| 7777198 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more | 2010-08-17 |
| 7692171 | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Sanjeev Baluja, Hichem M'Saad, Scott A. Hendrickson +2 more | 2010-04-06 |
| 7663121 | High efficiency UV curing system | Thomas Nowak, Juan Carlos Rocha-Alvarez, Andrzej Kaszuba, Scott A. Hendrickson, Dustin W. Ho +3 more | 2010-02-16 |
| 7622005 | Uniformity control for low flow process and chamber to chamber matching | Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Daemian Raj | 2009-11-24 |
| 7582167 | Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support | Andrzej Kaszuba, Sophia M. Velastegui, Visweswaren Sivaramakrishnan, Pyongwon Yim, Mario David Silvetti +2 more | 2009-09-01 |
| 7572337 | Blocker plate bypass to distribute gases in a chemical vapor deposition system | Juan Carlos Rocha-Alvarez, Ganesh Balasubramanian, Deenesh Padhi, Thomas Nowak, Bok Hoen Kim +2 more | 2009-08-11 |
| 7566891 | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors | Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Sanjeev Baluja, Scott A. Hendrickson +2 more | 2009-07-28 |
| 7498268 | Gas delivery system for semiconductor processing | Sudhir Gondhalekar, Padmanabhan Krishnaraj, Muhammad M. Rasheed, Hemant P. Mungekar, Thanh Pham +1 more | 2009-03-03 |
| 7425716 | Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to a large area electron beam | Alexandros T. Demos, Khaled A. Elsheref, Yuri Trachuk, Girish Dixit, Hichem M'Saad +1 more | 2008-09-16 |
| 7354501 | Upper chamber for high density plasma CVD | Sudhir Gondhalekar, Rolf Guenther, Steve Kim, Mehrdad Moshfegh, Shigeru Takehiro +2 more | 2008-04-08 |
| 7279049 | Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support | Andrzej Kaszuba, Sophia M. Velastegui, Visweswaren Sivaramakrishnan, Pyongwon Yim, Mario David Silvetti +2 more | 2007-10-09 |
| 7141138 | Gas delivery system for semiconductor processing | Sudhir Gondhalekar, Padmanabhan Krishnaraj, Muhammad M. Rasheed, Hemant P. Mungekar, Thanh Pham +1 more | 2006-11-28 |
| 7074298 | High density plasma CVD chamber | Sudhir Gondhalekar, Rolf Guenther, Shigeru Takehiro, Masayoshi Nohira, Tetsuya Ishikawa +1 more | 2006-07-11 |
| 6450117 | Directing a flow of gas in a substrate processing chamber | Laxman Murugesh, Padmanaban Krishnaraj, Michael S. Cox, Canfeng Lai, Narendra Dubey +2 more | 2002-09-17 |
| 6192829 | Antenna coil assemblies for substrate processing chambers | Michael P. Karazim, Tetsuya Ishikawa, Rudolf Gujer, Thomas Kring, Pavel Staryuk +2 more | 2001-02-27 |