Issued Patents All Time
Showing 51–75 of 122 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE42065 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2011-01-25 |
| 7871171 | Focusing-device for the radiation from a light source | Martin Antoni, Frank Melzer, Andreas Seifert | 2011-01-18 |
| 7869138 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil | Hans-Juergen Mann | 2011-01-11 |
| RE41667 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2010-09-14 |
| 7781750 | Oblique mirror-type normal-incidence collector system for light sources, particularly EUV plasma discharge sources | — | 2010-08-24 |
| 7782440 | Projection lens system of a microlithographic projection exposure installation | Helmut Beierl, Sascha Bleidistel, Toralf Gruner, Alexander Epple, Norbert Wabra +6 more | 2010-08-24 |
| 7782538 | Projection objective having a high aperture and a planar end surface | Susanne Beder, Karl-Heinz Schuster | 2010-08-24 |
| 7714983 | Illumination system for a microlithography projection exposure installation | Jess Koehler, Johannes Wangler, Markus Brotsack, Damian Fiolka, Manfred Maul | 2010-05-11 |
| 7684013 | Lithographic apparatus and device manufacturing method | Steven George Hansen, Donis Flagello, Bernd Geh, Vladan Blahnik | 2010-03-23 |
| 7626770 | Illumination system with zoom objective | Jens Ossmann | 2009-12-01 |
| 7605386 | Optical device with raster elements, and illumination system with the optical device | Johannes Wangler, Markus Deguenther, Birgit Kuerz, Christoph Menke | 2009-10-20 |
| 7592598 | Illumination system particularly for microlithography | Hans-Juergen Mann, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2009-09-22 |
| 7589903 | Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method | Susanne Beder, Wilhelm Ulrich, Heiko Feldmann, Toralf Gruner | 2009-09-15 |
| 7583433 | Multi mirror system for an illumination system | Martin Antoni, Isabel Escudero-Sanz, Johannes Wangler, Jorg Schultz | 2009-09-01 |
| 7572556 | Masks, lithography device and semiconductor component | Hans-Jurgen Mann, Martin Lowisch | 2009-08-11 |
| 7551361 | Lithography lens system and projection exposure system provided with at least one lithography lens system of this type | Hans-Juergen Rostalski, Alexander Epple, Aurelian Dodoc, Johannes Wangler, Karl-Heinz Schuster +3 more | 2009-06-23 |
| 7542217 | Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus | Markus Deguenther, Birgit Kuerz, Rafael Egger, Johannes Wangler, Manfred Maul | 2009-06-02 |
| 7511886 | Optical beam transformation system and illumination system comprising an optical beam transformation system | Joerg Schultz, Markus Deguenther, Markus Brotsack, Gerhard Fuerter, Manfred Maul +2 more | 2009-03-31 |
| 7474469 | Arrangement of optical elements in a microlithographic projection exposure apparatus | Michael Totzeck, Gerhart Fuerter, Olaf Dittmann, Karl-Heinz Schuster, David Shafer +1 more | 2009-01-06 |
| 7473907 | Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination | Martin Antoni, Johannes Wangler, Markus Weiss, Vadim Yevgenyevich Banine, Marcel Mathijs Theodore Marie Dierichs +5 more | 2009-01-06 |
| 7466489 | Projection objective having a high aperture and a planar end surface | Susanne Beder, Karl-Heinz Schuster | 2008-12-16 |
| 7460212 | Collector configured of mirror shells | Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek, Frank Melzer +1 more | 2008-12-02 |
| 7456408 | Illumination system particularly for microlithography | Hans-Juergen Mann, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2008-11-25 |
| 7443948 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni +2 more | 2008-10-28 |
| 7428105 | Objectives as a microlithography projection objective with at least one liquid lens | David Shafer, Susanne Beder, Karl-Heinz Schuster | 2008-09-23 |