Issued Patents All Time
Showing 101–122 of 122 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7090362 | Facet mirror having a number of mirror facets | Hubert Holderer, Andreas Heisler, Markus Weiss, Andreas Seifert, Frank Melzer +1 more | 2006-08-15 |
| 7075433 | Bluetooth theft control | — | 2006-07-11 |
| 7015489 | Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm | Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek, Frank Melzer +1 more | 2006-03-21 |
| 7006595 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni +2 more | 2006-02-28 |
| 6972841 | Method and apparatus for determining the non-volatile component of aerosol particles in a gas sample | Peter W. Krempl, Christian Reiter, Wolfgang Schindler | 2005-12-06 |
| 6964485 | Collector for an illumination system with a wavelength of less than or equal to 193 nm | Johannes Wangler | 2005-11-15 |
| 6947120 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2005-09-20 |
| 6947124 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2005-09-20 |
| 6927403 | Illumination system that suppresses debris from a light source | Martin Antoni, Johannes Wangler, Wilhelm Egle, Vadim Yevgenyevich Banine, Erik Roelof Loopstra | 2005-08-09 |
| 6903802 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Wilhelm Ulrich, Helmut Beierl | 2005-06-07 |
| 6891980 | Method and apparatus for analysis of schlieren | Michael Gerhard, Frank-Thomas Lentes, Christian Kusch, Ewald Moersen | 2005-05-10 |
| 6867923 | Projection lens, in particular for microlithography | Karl-Heinz Schuster | 2005-03-15 |
| 6858853 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2005-02-22 |
| 6859328 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Hein Schuster, Udo Dinger, Martin Antoni +2 more | 2005-02-22 |
| 6840640 | Multi mirror system for an illumination system | Martin Antoni, Isabel Escudero-Sanz, Johannes Wangler, Jorg Schultz | 2005-01-11 |
| 6836530 | Illumination system with a plurality of individual gratings | Markus Weiss, Bernd Kleemann, Karlfried Osterried, Johannes Wangler, Frank Melzer +2 more | 2004-12-28 |
| 6806942 | Projection exposure system | Karl-Heinz Schuster, Wilhelm Ulrich, Toralf Gruner, Daniel Kraehmer, Alexander Epple +2 more | 2004-10-19 |
| 6658084 | Illumination system with variable adjustment of the illumination | — | 2003-12-02 |
| 6655808 | Focusing-device for the radiation from a light source | Martin Antoni, Frank Melzer, Andreas Seifert | 2003-12-02 |
| 6646718 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Wilhelm Ulrich, Helmut Beierl | 2003-11-11 |
| 6611574 | Illumination system with reduced heat load | Wilhelm Ulrich, Martin Antoni | 2003-08-26 |
| 6438199 | Illumination system particularly for microlithography | Jorg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger, Martin Antoni | 2002-08-20 |