Issued Patents All Time
Showing 76–100 of 122 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7410265 | Focusing-device for the radiation from a light source | Martin Antoni, Frank Melzer, Andreas Seifert, Wilhelm Egle, Bernhard Gellrich +1 more | 2008-08-12 |
| 7405809 | Illumination system particularly for microlithography | Joachim Hainz, Erich Schubert | 2008-07-29 |
| 7400699 | Illumination system with raster elements of different sizes | Wilhelm Ulrich, Martin Antoni | 2008-07-15 |
| 7385764 | Objectives as a microlithography projection objective with at least one liquid lens | David Shafer, Susanne Beder, Karl-Heinz Schuster | 2008-06-10 |
| 7369216 | Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby | Johannes Hubertus Josephina Moors, Uwe Mickan, Hans-Juergen Mann | 2008-05-06 |
| 7362414 | Optical system having an optical element that can be brought into at least two positions | Joachim Hainz, Joachim Wietzorrek, Markus Weiss | 2008-04-22 |
| 7354168 | Facet mirror having a number of mirror facets | Hubert Holderer, Andreas Heisler, Markus Weiss, Andreas Seifert, Frank Melzer +4 more | 2008-04-08 |
| 7348565 | Illumination system particularly for microlithography | Hans-Juergen Mann, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2008-03-25 |
| 7329886 | EUV illumination system having a plurality of light sources for illuminating an optical element | Martin Antoni, Nils Dieckmann, Dirk Rothweiler, Jorg Schultz | 2008-02-12 |
| 7321126 | Collector with fastening devices for fastening mirror shells | Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler +5 more | 2008-01-22 |
| 7319509 | Attenuator for attenuating wavelengths unequal to a used wavelength | — | 2008-01-15 |
| 7312462 | Illumination system having a nested collector for annular illumination of an exit pupil | Johannes Wangler, Eric Sohmen | 2007-12-25 |
| 7256932 | Optical system for ultraviolet light | Alexander Epple, Toralf Gruner | 2007-08-14 |
| 7248667 | Illumination system with a grating element | Markus Weiss, Bernd Kleemann | 2007-07-24 |
| 7244954 | Collector having unused region for illumination systems using a wavelength ≦193 nm | Wilhelm Egle, Markus Weiss, Joachim Hainz, Jochen Wietzorrek, Frank Melzer +1 more | 2007-07-17 |
| 7221516 | Projection lens for a microlithographic projection exposure apparatus | Hans-Jurgen Mann | 2007-05-22 |
| 7196841 | Lighting system, particularly for use in extreme ultraviolet (EUV) lithography | Frank Melzer | 2007-03-27 |
| 7186983 | Illumination system particularly for microlithography | Hans-Juergen Mann, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2007-03-06 |
| 7154678 | Projection objective having adjacently mounted aspheric lens surfaces | Karl-Heinz Schuster, David Shafer, Wilhelm Ulrich, Helmut Beierl | 2006-12-26 |
| 7145637 | Illumination system having a more efficient collector optic | — | 2006-12-05 |
| 7142285 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2006-11-28 |
| 7126137 | Illumination system with field mirrors for producing uniform scanning energy | Joachim Hainz, Hans-Joachim Frasch, Johannes Wangler, Joachim Wietzorrek, Jorg Schultz | 2006-10-24 |
| 7116394 | Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system | Levinus Pieter Bakker, Ralph Kurt, Bastiaan Mertens, Markus Weiss, Johann Trenkler | 2006-10-03 |
| 7109497 | Illumination system particularly for microlithography | Martin Antoni, Johannes Wangler | 2006-09-19 |
| 7091505 | Collector with fastening devices for fastening mirror shells | Wilhelm Egle, Markus Weiss, Joachim Hainz, Joachim Wietzorrek, Johannes Wangler +5 more | 2006-08-15 |