Issued Patents All Time
Showing 26–50 of 122 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8953173 | Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate | Hans-Juergen Mann | 2015-02-10 |
| 8908269 | Immersion catadioptric projection objective having two intermediate images | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann +2 more | 2014-12-09 |
| 8885141 | EUV lithography device and method for processing an optical element | Yim-Bun Patrick Kwan, Stefan Schmidt, Dirk Heinrich Ehm, Dieter Kraus, Stefan Wiesner +3 more | 2014-11-11 |
| 8854606 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Jurgen Mann, Toralf Gruner, Olaf Dittmann, Michael Totzeck | 2014-10-07 |
| 8810927 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil | Hans-Juergen Mann | 2014-08-19 |
| 8730572 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann +2 more | 2014-05-20 |
| 8705005 | Microlithographic illumination system | Markus Deguenther, Michael Layh, Michael Gerhard, Bruno Thome | 2014-04-22 |
| 8605257 | Projection system with compensation of intensity variations and compensation element therefor | Patrick Scheible, Alexandra Pazidis, Reiner Garreis, Michael Totzeck, Heiko Feldmann +2 more | 2013-12-10 |
| 8416490 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann +2 more | 2013-04-09 |
| 8411356 | Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror | Ralf Mueller, Aksel Goehnermeier | 2013-04-02 |
| 8355201 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann +2 more | 2013-01-15 |
| 8345267 | Apparatus for microlithographic projection exposure and apparatus for inspecting a surface of a substrate | Hans-Juergen Mann | 2013-01-01 |
| 8319944 | Projection lens system of a microlithographic projection exposure installation | Helmut Beierl, Sascha Bleidistel, Toralf Gruner, Alexander Epple, Norbert Wabra +6 more | 2012-11-27 |
| 8268518 | Method and lithography device with a mask reflecting light | Hans-Juergen Mann, Martin Lowisch | 2012-09-18 |
| 8208199 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann +2 more | 2012-06-26 |
| 8208198 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann +2 more | 2012-06-26 |
| 8199400 | Catadioptric projection objective | David Shafer, Wilhelm Ulrich, Aurelian Dodoc, Rudolf Von Buenau, Hans-Juergen Mann +2 more | 2012-06-12 |
| 8134687 | Illumination system of a microlithographic exposure apparatus | Johannes Wangler, Rafael Egger, Wilhelm Ulrich | 2012-03-13 |
| 8107054 | Microlithographic projection exposure apparatus | Michael Totzeck, Aksel Goehnermeier, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann +1 more | 2012-01-31 |
| 8094380 | Projection objective and projection exposure apparatus with negative back focus of the entry pupil | Hans-Juergen Mann | 2012-01-10 |
| 8027088 | Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror | Ralf Mueller, Aksel Goehnermeier | 2011-09-27 |
| 7982854 | Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a system | Hans-Juergen Mann, Toralf Gruner, Olaf Dittmann, Michael Totzeck | 2011-07-19 |
| 7977651 | Illumination system particularly for microlithography | Hans-Juergen Mann, Joerg Schultz, Johannes Wangler, Karl-Heinz Schuster, Udo Dinger +2 more | 2011-07-12 |
| 7914955 | Masks, lithography device and semiconductor component | Hans-Juergen Mann, Martin Lowisch | 2011-03-29 |
| 7911584 | Illumination system for microlithography | Joachim Wietzorrek, Joachim Hainz, Gabriele Weirauch, Manfred Maul | 2011-03-22 |