Issued Patents All Time
Showing 126–150 of 175 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6129044 | Apparatus for substrate processing with improved throughput and yield | Jun Zhao, Ashok Sinha, Avi Tepman, Lee Luo, Alex Schreiber +4 more | 2000-10-10 |
| 6123864 | Etch chamber | Simon W. Tam, Semyon Sherstinsky, Alan F. Morrison, Ashok Sinha | 2000-09-26 |
| 6106625 | Reactor useful for chemical vapor deposition of titanium nitride | Keith Kuang-Kuo Koai, Mark S. Johnson, Lawrence Chung-Lai Lei | 2000-08-22 |
| 6103014 | Chemical vapor deposition chamber | Lawrence Chung-Lai Lei, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Ashok Sinha | 2000-08-15 |
| 6099649 | Chemical vapor deposition hot-trap for unreacted precursor conversion and effluent removal | John V. Schmitt, Ling Chen, George Michael Bleyle, Yu D. Cong, Alfred Mak | 2000-08-08 |
| 6090706 | Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein | Susan Telford, Michio Aruga | 2000-07-18 |
| 6079356 | Reactor optimized for chemical vapor deposition of titanium | Salvador P. Umotoy, Anh N. Nguyen, Truc T. Tran, Lawrence Chung-Lei | 2000-06-27 |
| 6066836 | High temperature resistive heater for a process chamber | Steven Chen, Henry Ho, Ming Xi, Chen-An Chen, Chiliang Chen | 2000-05-23 |
| 6063441 | Processing chamber and method for confining plasma | Keith Kuang-Kuo Koai, Lawrence Chung-Lai Lei, Mark S. Johnson | 2000-05-16 |
| 6040022 | PECVD of compounds of silicon from silane and nitrogen | David N. Wang, John M. White, Dan Maydan | 2000-03-21 |
| 6027606 | Center gas feed apparatus for a high density plasma reactor | John W. Mohn, Raymond Hung, Kenneth S. Collins, Ru-Liang Lee | 2000-02-22 |
| 6020270 | Bomine and iodine etch process for silicon and silicides | Jerry Wong, David N. Wang, Alfred Mak, Dan Maydan | 2000-02-01 |
| 5989999 | Construction of a tantalum nitride film on a semiconductor wafer | Timothy E. Levine, Ling Chen, Roderick C. Mosely, Karl A. Littau, Ivo Raaijmakers | 1999-11-23 |
| 5983906 | Methods and apparatus for a cleaning process in a high temperature, corrosive, plasma environment | Jun Zhao, Lee Luo, Jia-Xiang Wang, Xiao Liang Jin, Stefan Wolff +2 more | 1999-11-16 |
| 5964947 | Removable pumping channel liners within a chemical vapor deposition chamber | Jun Zhao, Ashok Sinha, Avi Tepman, Lee Luo, Alex Schreiber +4 more | 1999-10-12 |
| 5935338 | Chemical vapor deposition chamber | Lawrence Chung-Lai Lei, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Ashok Sinha | 1999-08-10 |
| 5882419 | Chemical vapor deposition chamber | Ashok Sinha, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1999-03-16 |
| 5874362 | Bromine and iodine etch process for silicon and silicides | Jerry Wong, David N. Wang, Alfred Mak, Dan Maydan | 1999-02-23 |
| 5856240 | Chemical vapor deposition of a thin film onto a substrate | Ashok Sinha, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Lawrence Chung-Lai Lei | 1999-01-05 |
| 5855687 | Substrate support shield in wafer processing reactors | Dale R. DuBois, Alan F. Morrison, Richard A. Marsh | 1999-01-05 |
| 5851299 | Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions | David Cheng | 1998-12-22 |
| 5846332 | Thermally floating pedestal collar in a chemical vapor deposition chamber | Jun Zhao, Ashok Sinha, Avi Tepman, Lee Luo, Alex Schreiber +4 more | 1998-12-08 |
| 5834068 | Wafer surface temperature control for deposition of thin films | Chyi Chern, Wei-Min Chen, Marvin Liao, Jennifer Meng Chu Tseng | 1998-11-10 |
| 5817576 | Utilization of SiH.sub.4 soak and purge in deposition processes | Meng Chu Tseng, Ramanujapuram A. Srinivas, Klaus-Dieter Rinnen, Moshe Eizenberg, Susan Telford | 1998-10-06 |
| 5780360 | Purge in silicide deposition processes dichlorosilane | Jennifer Meng Chu Tseng, Ramanujapuram A. Srinivas, Klaus-Dieter Rinnen, Moshe Eizenberg, Susan Telford | 1998-07-14 |